Self-supporting tantalum masks for deep X-ray lithography with synchrotron radiation

S. V. Litvin, V. G. Kanaev, E. G. Larionova, N. V. Glazunova, L. P. Gromova, V. I. Yurchenko, N. A. Timchenko, L. A. Mezentseva, V. P. Nazmov, V. F. Pindyurin

Research output: Chapter in Book/Report/Conference proceedingChapter

Abstract

Development of the present-day technologies of manufacturing deep structures with submicron elements bases on the deep X-ray lithography method with the usage of synchrotron radiation. Microelectronics-used X-ray patterns with a to 1.0 μm golden masking covering on different-type membranes become of unfit in this case both from the angle of contrast and from the standpoint of radiation and heat stability. X-ray patterns with the membrane on the base of tantalum 2 μm thick, that are high contrasting as to synchrotron radiation with wavelength of 0.2 to 1.0 nm, have been developed and manufactured. A set of pores 0.7 μm in diameter 1.5 μm apart in two directions was formed as the topological pattern.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Pages426-428
Number of pages3
Volume3676
EditionII
Publication statusPublished - 1999
EventProceedings of the 1999 Emerging Lithographic Technologies III - Santa Clara, CA, USA
Duration: 15 Mar 199917 Mar 1999

Other

OtherProceedings of the 1999 Emerging Lithographic Technologies III
CitySanta Clara, CA, USA
Period15.3.9917.3.99

Fingerprint

X ray lithography
Tantalum
tantalum
Synchrotron radiation
Masks
synchrotron radiation
masks
lithography
Membranes
X rays
Microelectronics
membranes
x rays
masking
Radiation
microelectronics
Wavelength
coverings
manufacturing
porosity

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

Cite this

Litvin, S. V., Kanaev, V. G., Larionova, E. G., Glazunova, N. V., Gromova, L. P., Yurchenko, V. I., ... Pindyurin, V. F. (1999). Self-supporting tantalum masks for deep X-ray lithography with synchrotron radiation. In Proceedings of SPIE - The International Society for Optical Engineering (II ed., Vol. 3676, pp. 426-428). Society of Photo-Optical Instrumentation Engineers.

Self-supporting tantalum masks for deep X-ray lithography with synchrotron radiation. / Litvin, S. V.; Kanaev, V. G.; Larionova, E. G.; Glazunova, N. V.; Gromova, L. P.; Yurchenko, V. I.; Timchenko, N. A.; Mezentseva, L. A.; Nazmov, V. P.; Pindyurin, V. F.

Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3676 II. ed. Society of Photo-Optical Instrumentation Engineers, 1999. p. 426-428.

Research output: Chapter in Book/Report/Conference proceedingChapter

Litvin, SV, Kanaev, VG, Larionova, EG, Glazunova, NV, Gromova, LP, Yurchenko, VI, Timchenko, NA, Mezentseva, LA, Nazmov, VP & Pindyurin, VF 1999, Self-supporting tantalum masks for deep X-ray lithography with synchrotron radiation. in Proceedings of SPIE - The International Society for Optical Engineering. II edn, vol. 3676, Society of Photo-Optical Instrumentation Engineers, pp. 426-428, Proceedings of the 1999 Emerging Lithographic Technologies III, Santa Clara, CA, USA, 15.3.99.
Litvin SV, Kanaev VG, Larionova EG, Glazunova NV, Gromova LP, Yurchenko VI et al. Self-supporting tantalum masks for deep X-ray lithography with synchrotron radiation. In Proceedings of SPIE - The International Society for Optical Engineering. II ed. Vol. 3676. Society of Photo-Optical Instrumentation Engineers. 1999. p. 426-428
Litvin, S. V. ; Kanaev, V. G. ; Larionova, E. G. ; Glazunova, N. V. ; Gromova, L. P. ; Yurchenko, V. I. ; Timchenko, N. A. ; Mezentseva, L. A. ; Nazmov, V. P. ; Pindyurin, V. F. / Self-supporting tantalum masks for deep X-ray lithography with synchrotron radiation. Proceedings of SPIE - The International Society for Optical Engineering. Vol. 3676 II. ed. Society of Photo-Optical Instrumentation Engineers, 1999. pp. 426-428
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