Self-supporting tantalum masks for deep X-ray lithography with synchrotron radiation

S. V. Litvin, V. G. Kanaev, E. G. Larionova, N. V. Glazunova, L. P. Gromova, V. I. Yurchenko, N. A. Timchenko, L. A. Mezentseva, V. P. Nazmov, V. F. Pindyurin

Research output: Chapter in Book/Report/Conference proceedingChapter


Development of the present-day technologies of manufacturing deep structures with submicron elements bases on the deep X-ray lithography method with the usage of synchrotron radiation. Microelectronics-used X-ray patterns with a to 1.0 μm golden masking covering on different-type membranes become of unfit in this case both from the angle of contrast and from the standpoint of radiation and heat stability. X-ray patterns with the membrane on the base of tantalum 2 μm thick, that are high contrasting as to synchrotron radiation with wavelength of 0.2 to 1.0 nm, have been developed and manufactured. A set of pores 0.7 μm in diameter 1.5 μm apart in two directions was formed as the topological pattern.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
PublisherSociety of Photo-Optical Instrumentation Engineers
Number of pages3
Publication statusPublished - 1999
EventProceedings of the 1999 Emerging Lithographic Technologies III - Santa Clara, CA, USA
Duration: 15 Mar 199917 Mar 1999


OtherProceedings of the 1999 Emerging Lithographic Technologies III
CitySanta Clara, CA, USA

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Condensed Matter Physics

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