Self-images contrast enhancement for displacement Talbot lithography by means of composite mesoscale amplitude-phase masks

Yuri E. Geints, Oleg V. Minin, Igor V. Minin, Alexander A. Zemlyanov

Research output: Contribution to journalArticle


We propose a new design of composite wavelength-scale amplitude-phase diffraction grating as applied to the displacement Talbot lithography. The grating is composed of a conventional metal amplitude binary mask with superposed dielectric phase steps and provides for manyfold optical contrast enhancement of the integrated 'Talbot carpet' as opposed to the amplitude and phase masks purely. By means of the finite element calculations, we analyze the spatial field structure in the proposed gratings with different geometric ridge shapes and show that due to Mie-type resonances excitation the semielliptical dielectric steps in the combination with metal amplitude mask demonstrate excellent spatial resolution (∼) and highest optical contrast (∼22 dB) of integrated Talbot self-images.

Original languageEnglish
Article number015002
JournalJournal of Optics (United Kingdom)
Issue number1
Publication statusPublished - 1 Jan 2020



  • displacement Talbot lithography
  • Mie-resonance
  • optical contrast
  • subwavelength diffraction grating
  • Talbot effect

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics

Cite this