Selective deposition of polycrystalline diamond films using photolithography with addition of nanodiamonds as nucleation centers

V. V. Okhotnikov, S. A. Linnik, Alexander Valerievich Gaydaychuk, D. V. Shashev, G. Yu Nazarova, V. I. Yurchenko

Research output: Contribution to journalConference article

5 Citations (Scopus)

Abstract

A new method of selective deposition of polycrystalline diamond has been developed and studied. The diamond coatings with a complex, predetermined geometry and resolution up to 5 μm were obtained. A high density of polycrystallites in the coating area was reached (up to 32•107 pcs/cm2). The uniformity of the film reached 100%, and the degree of the surface contamination by parasitic crystals did not exceed 2%. The technology was based on the application of the standard photolithography with an addition of nanodiamond suspension into the photoresist that provided the creation of the centers of further nucleation in the areas which require further overgrowth. The films were deposited onto monocrystalline silicon substrates using the method of "hot filaments" in the CVD reactor. The properties of the coating and the impact of the nanodiamond suspension concentration in the photoresist were also studied. The potential use of the given method includes a high resolution, technological efficiency, and low labor costs compared to the standard methods (laser treatment, chemical etching in aggressive environments,).

Original languageEnglish
Article number012001
JournalIOP Conference Series: Materials Science and Engineering
Volume116
Issue number1
DOIs
Publication statusPublished - 3 Mar 2016
EventInternational Conference on Advanced Materials and New Technologies in Modern Materials Science 2015, AMNT 2015 - Tomsk, Russian Federation
Duration: 9 Nov 201511 Nov 2015

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Nanodiamonds
Diamond films
Photolithography
Diamond
Nucleation
Photoresists
Coatings
Diamonds
Suspensions
Monocrystalline silicon
Chemical vapor deposition
Etching
Contamination
Personnel
Crystals
Geometry
Lasers
Substrates
Costs

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

Cite this

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abstract = "A new method of selective deposition of polycrystalline diamond has been developed and studied. The diamond coatings with a complex, predetermined geometry and resolution up to 5 μm were obtained. A high density of polycrystallites in the coating area was reached (up to 32•107 pcs/cm2). The uniformity of the film reached 100{\%}, and the degree of the surface contamination by parasitic crystals did not exceed 2{\%}. The technology was based on the application of the standard photolithography with an addition of nanodiamond suspension into the photoresist that provided the creation of the centers of further nucleation in the areas which require further overgrowth. The films were deposited onto monocrystalline silicon substrates using the method of {"}hot filaments{"} in the CVD reactor. The properties of the coating and the impact of the nanodiamond suspension concentration in the photoresist were also studied. The potential use of the given method includes a high resolution, technological efficiency, and low labor costs compared to the standard methods (laser treatment, chemical etching in aggressive environments,).",
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T1 - Selective deposition of polycrystalline diamond films using photolithography with addition of nanodiamonds as nucleation centers

AU - Okhotnikov, V. V.

AU - Linnik, S. A.

AU - Gaydaychuk, Alexander Valerievich

AU - Shashev, D. V.

AU - Nazarova, G. Yu

AU - Yurchenko, V. I.

PY - 2016/3/3

Y1 - 2016/3/3

N2 - A new method of selective deposition of polycrystalline diamond has been developed and studied. The diamond coatings with a complex, predetermined geometry and resolution up to 5 μm were obtained. A high density of polycrystallites in the coating area was reached (up to 32•107 pcs/cm2). The uniformity of the film reached 100%, and the degree of the surface contamination by parasitic crystals did not exceed 2%. The technology was based on the application of the standard photolithography with an addition of nanodiamond suspension into the photoresist that provided the creation of the centers of further nucleation in the areas which require further overgrowth. The films were deposited onto monocrystalline silicon substrates using the method of "hot filaments" in the CVD reactor. The properties of the coating and the impact of the nanodiamond suspension concentration in the photoresist were also studied. The potential use of the given method includes a high resolution, technological efficiency, and low labor costs compared to the standard methods (laser treatment, chemical etching in aggressive environments,).

AB - A new method of selective deposition of polycrystalline diamond has been developed and studied. The diamond coatings with a complex, predetermined geometry and resolution up to 5 μm were obtained. A high density of polycrystallites in the coating area was reached (up to 32•107 pcs/cm2). The uniformity of the film reached 100%, and the degree of the surface contamination by parasitic crystals did not exceed 2%. The technology was based on the application of the standard photolithography with an addition of nanodiamond suspension into the photoresist that provided the creation of the centers of further nucleation in the areas which require further overgrowth. The films were deposited onto monocrystalline silicon substrates using the method of "hot filaments" in the CVD reactor. The properties of the coating and the impact of the nanodiamond suspension concentration in the photoresist were also studied. The potential use of the given method includes a high resolution, technological efficiency, and low labor costs compared to the standard methods (laser treatment, chemical etching in aggressive environments,).

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