Role of energy in low-temperature high-rate formation of hydrophilic Ti O2 thin films using pulsed magnetron sputtering

J. Musil, J. Šícha, D. Heřman, R. Čerstvý

Research output: Contribution to journalArticle

62 Citations (Scopus)

Abstract

The article reports on low-temperature high-rate deposition of hydrophilic Ti O2 thin films using dc pulse dual magnetron (DM) sputtering in an Ar+ O2 mixture on unheated glass substrates. DM is operated in a bipolar asymmetric mode and is equipped with Ti (99.5%) targets 50 mm in diameter. Main attention is concentrated on the investigation of the effect of an energy delivered to the Ti O2-x film, growing on unheated and heated substrates, by the ion bombardment on its structure. The effect of the length and shape of the pulse on the structure and deposition rate aD of the film is investigated in detail. It is shown that (1) the shortening of the pulse length to about ∼2 μs strongly enhances the ion bombardment of electrically insulating film which makes it possible to form nanocrystalline strongly hydrophilic Ti O2 films at low (∼100 °C) values of the substrate temperature Ts and (2) the increase of a repetition frequency fr of pulses results in a strong increase of aD; aD increases almost two times when fr is increased from 100 to 300 kHz. It was found that (1) hydrophilic Ti O2 films several hundred nanometers thick are crystalline and can be sputtered on unheated glass substrates with a high deposition rate aD =80 nmmin at substrate surface temperatures Tsurf 180 °C when fr =350 kHz is used and (2) hydrophilic Ti O2-x films sputtered at low values of the substrate surface temperature Tsurf ≈100 °C exhibit nanocrystalline structure and can be formed if much lower deposition rates aD ≤5 nmmin are used. Correlations between the hydrophilicity of Ti O2-x film, its structure, Tsurf, process parameters, and the film deposition rate aD are given. A summary of the present state of knowledge in this field is presented.

Original languageEnglish
Pages (from-to)666-674
Number of pages9
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume25
Issue number4
DOIs
Publication statusPublished - 2 Aug 2007

Fingerprint

Magnetron sputtering
magnetron sputtering
Deposition rates
Thin films
thin films
Substrates
Temperature
Ion bombardment
energy
pulses
surface temperature
bombardment
Glass
nanostructure (characteristics)
Hydrophilicity
Film growth
glass
repetition
ions
Crystalline materials

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Role of energy in low-temperature high-rate formation of hydrophilic Ti O2 thin films using pulsed magnetron sputtering. / Musil, J.; Šícha, J.; Heřman, D.; Čerstvý, R.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 25, No. 4, 02.08.2007, p. 666-674.

Research output: Contribution to journalArticle

@article{f5adf70d8af545dbaac75f4abd9a1f0b,
title = "Role of energy in low-temperature high-rate formation of hydrophilic Ti O2 thin films using pulsed magnetron sputtering",
abstract = "The article reports on low-temperature high-rate deposition of hydrophilic Ti O2 thin films using dc pulse dual magnetron (DM) sputtering in an Ar+ O2 mixture on unheated glass substrates. DM is operated in a bipolar asymmetric mode and is equipped with Ti (99.5{\%}) targets 50 mm in diameter. Main attention is concentrated on the investigation of the effect of an energy delivered to the Ti O2-x film, growing on unheated and heated substrates, by the ion bombardment on its structure. The effect of the length and shape of the pulse on the structure and deposition rate aD of the film is investigated in detail. It is shown that (1) the shortening of the pulse length to about ∼2 μs strongly enhances the ion bombardment of electrically insulating film which makes it possible to form nanocrystalline strongly hydrophilic Ti O2 films at low (∼100 °C) values of the substrate temperature Ts and (2) the increase of a repetition frequency fr of pulses results in a strong increase of aD; aD increases almost two times when fr is increased from 100 to 300 kHz. It was found that (1) hydrophilic Ti O2 films several hundred nanometers thick are crystalline and can be sputtered on unheated glass substrates with a high deposition rate aD =80 nmmin at substrate surface temperatures Tsurf 180 °C when fr =350 kHz is used and (2) hydrophilic Ti O2-x films sputtered at low values of the substrate surface temperature Tsurf ≈100 °C exhibit nanocrystalline structure and can be formed if much lower deposition rates aD ≤5 nmmin are used. Correlations between the hydrophilicity of Ti O2-x film, its structure, Tsurf, process parameters, and the film deposition rate aD are given. A summary of the present state of knowledge in this field is presented.",
author = "J. Musil and J. Š{\'i}cha and D. Heřman and R. Čerstv{\'y}",
year = "2007",
month = "8",
day = "2",
doi = "10.1116/1.2736680",
language = "English",
volume = "25",
pages = "666--674",
journal = "Journal of Vacuum Science and Technology A",
issn = "0734-2101",
publisher = "AVS Science and Technology Society",
number = "4",

}

TY - JOUR

T1 - Role of energy in low-temperature high-rate formation of hydrophilic Ti O2 thin films using pulsed magnetron sputtering

AU - Musil, J.

AU - Šícha, J.

AU - Heřman, D.

AU - Čerstvý, R.

PY - 2007/8/2

Y1 - 2007/8/2

N2 - The article reports on low-temperature high-rate deposition of hydrophilic Ti O2 thin films using dc pulse dual magnetron (DM) sputtering in an Ar+ O2 mixture on unheated glass substrates. DM is operated in a bipolar asymmetric mode and is equipped with Ti (99.5%) targets 50 mm in diameter. Main attention is concentrated on the investigation of the effect of an energy delivered to the Ti O2-x film, growing on unheated and heated substrates, by the ion bombardment on its structure. The effect of the length and shape of the pulse on the structure and deposition rate aD of the film is investigated in detail. It is shown that (1) the shortening of the pulse length to about ∼2 μs strongly enhances the ion bombardment of electrically insulating film which makes it possible to form nanocrystalline strongly hydrophilic Ti O2 films at low (∼100 °C) values of the substrate temperature Ts and (2) the increase of a repetition frequency fr of pulses results in a strong increase of aD; aD increases almost two times when fr is increased from 100 to 300 kHz. It was found that (1) hydrophilic Ti O2 films several hundred nanometers thick are crystalline and can be sputtered on unheated glass substrates with a high deposition rate aD =80 nmmin at substrate surface temperatures Tsurf 180 °C when fr =350 kHz is used and (2) hydrophilic Ti O2-x films sputtered at low values of the substrate surface temperature Tsurf ≈100 °C exhibit nanocrystalline structure and can be formed if much lower deposition rates aD ≤5 nmmin are used. Correlations between the hydrophilicity of Ti O2-x film, its structure, Tsurf, process parameters, and the film deposition rate aD are given. A summary of the present state of knowledge in this field is presented.

AB - The article reports on low-temperature high-rate deposition of hydrophilic Ti O2 thin films using dc pulse dual magnetron (DM) sputtering in an Ar+ O2 mixture on unheated glass substrates. DM is operated in a bipolar asymmetric mode and is equipped with Ti (99.5%) targets 50 mm in diameter. Main attention is concentrated on the investigation of the effect of an energy delivered to the Ti O2-x film, growing on unheated and heated substrates, by the ion bombardment on its structure. The effect of the length and shape of the pulse on the structure and deposition rate aD of the film is investigated in detail. It is shown that (1) the shortening of the pulse length to about ∼2 μs strongly enhances the ion bombardment of electrically insulating film which makes it possible to form nanocrystalline strongly hydrophilic Ti O2 films at low (∼100 °C) values of the substrate temperature Ts and (2) the increase of a repetition frequency fr of pulses results in a strong increase of aD; aD increases almost two times when fr is increased from 100 to 300 kHz. It was found that (1) hydrophilic Ti O2 films several hundred nanometers thick are crystalline and can be sputtered on unheated glass substrates with a high deposition rate aD =80 nmmin at substrate surface temperatures Tsurf 180 °C when fr =350 kHz is used and (2) hydrophilic Ti O2-x films sputtered at low values of the substrate surface temperature Tsurf ≈100 °C exhibit nanocrystalline structure and can be formed if much lower deposition rates aD ≤5 nmmin are used. Correlations between the hydrophilicity of Ti O2-x film, its structure, Tsurf, process parameters, and the film deposition rate aD are given. A summary of the present state of knowledge in this field is presented.

UR - http://www.scopus.com/inward/record.url?scp=34547281830&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=34547281830&partnerID=8YFLogxK

U2 - 10.1116/1.2736680

DO - 10.1116/1.2736680

M3 - Article

VL - 25

SP - 666

EP - 674

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 4

ER -