Reprint of

Physical mechanisms of macroparticles number density decreasing on a substrate immersed in vacuum arc plasma at negative high-frequency short-pulsed biasing

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Abstract

The objective of this investigation was to study the physical mechanisms of macroparticles (MPs) number density decreasing on a substrate immersed in a vacuum arc plasma. It was found that negative repetitively pulsed biasing of the substrate significantly reduced the MPs content on surface. Several different physical mechanisms for the MPs decreasing have been identified. It was established that up to 10% of the MPs are repelled by the sheath electric field. Reduction of MPs density by almost 20% is attributable to ion sputtering after 2 min of processing. It was found that enhanced ion sputtering, MPs evaporation on substrate surface, and even evaporation of MPs in a sheath, can take place depending on the cathode material and the irradiation parameters.

Original languageEnglish
Pages (from-to)115-119
Number of pages5
JournalApplied Surface Science
Volume310
DOIs
Publication statusPublished - 15 Aug 2014

Fingerprint

Vacuum
Plasmas
Sputtering
Evaporation
Substrates
Ions
Cathodes
Electric fields
Irradiation
Processing

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

Cite this

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title = "Reprint of: Physical mechanisms of macroparticles number density decreasing on a substrate immersed in vacuum arc plasma at negative high-frequency short-pulsed biasing",
abstract = "The objective of this investigation was to study the physical mechanisms of macroparticles (MPs) number density decreasing on a substrate immersed in a vacuum arc plasma. It was found that negative repetitively pulsed biasing of the substrate significantly reduced the MPs content on surface. Several different physical mechanisms for the MPs decreasing have been identified. It was established that up to 10{\%} of the MPs are repelled by the sheath electric field. Reduction of MPs density by almost 20{\%} is attributable to ion sputtering after 2 min of processing. It was found that enhanced ion sputtering, MPs evaporation on substrate surface, and even evaporation of MPs in a sheath, can take place depending on the cathode material and the irradiation parameters.",
author = "Ryabchikov, {A. I.} and Sivin, {Denis Olegovich} and Bumagina, {A. I.}",
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AU - Bumagina, A. I.

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AB - The objective of this investigation was to study the physical mechanisms of macroparticles (MPs) number density decreasing on a substrate immersed in a vacuum arc plasma. It was found that negative repetitively pulsed biasing of the substrate significantly reduced the MPs content on surface. Several different physical mechanisms for the MPs decreasing have been identified. It was established that up to 10% of the MPs are repelled by the sheath electric field. Reduction of MPs density by almost 20% is attributable to ion sputtering after 2 min of processing. It was found that enhanced ion sputtering, MPs evaporation on substrate surface, and even evaporation of MPs in a sheath, can take place depending on the cathode material and the irradiation parameters.

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