Abstract
The objective of this investigation was to study the physical mechanisms of macroparticles (MPs) number density decreasing on a substrate immersed in a vacuum arc plasma. It was found that negative repetitively pulsed biasing of the substrate significantly reduced the MPs content on surface. Several different physical mechanisms for the MPs decreasing have been identified. It was established that up to 10% of the MPs are repelled by the sheath electric field. Reduction of MPs density by almost 20% is attributable to ion sputtering after 2 min of processing. It was found that enhanced ion sputtering, MPs evaporation on substrate surface, and even evaporation of MPs in a sheath, can take place depending on the cathode material and the irradiation parameters.
| Original language | English |
|---|---|
| Pages (from-to) | 115-119 |
| Number of pages | 5 |
| Journal | Applied Surface Science |
| Volume | 310 |
| DOIs | |
| Publication status | Published - 15 Aug 2014 |
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ASJC Scopus subject areas
- Surfaces, Coatings and Films
Cite this
Reprint of : Physical mechanisms of macroparticles number density decreasing on a substrate immersed in vacuum arc plasma at negative high-frequency short-pulsed biasing. / Ryabchikov, A. I.; Sivin, Denis Olegovich; Bumagina, A. I.
In: Applied Surface Science, Vol. 310, 15.08.2014, p. 115-119.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Reprint of
T2 - Physical mechanisms of macroparticles number density decreasing on a substrate immersed in vacuum arc plasma at negative high-frequency short-pulsed biasing
AU - Ryabchikov, A. I.
AU - Sivin, Denis Olegovich
AU - Bumagina, A. I.
PY - 2014/8/15
Y1 - 2014/8/15
N2 - The objective of this investigation was to study the physical mechanisms of macroparticles (MPs) number density decreasing on a substrate immersed in a vacuum arc plasma. It was found that negative repetitively pulsed biasing of the substrate significantly reduced the MPs content on surface. Several different physical mechanisms for the MPs decreasing have been identified. It was established that up to 10% of the MPs are repelled by the sheath electric field. Reduction of MPs density by almost 20% is attributable to ion sputtering after 2 min of processing. It was found that enhanced ion sputtering, MPs evaporation on substrate surface, and even evaporation of MPs in a sheath, can take place depending on the cathode material and the irradiation parameters.
AB - The objective of this investigation was to study the physical mechanisms of macroparticles (MPs) number density decreasing on a substrate immersed in a vacuum arc plasma. It was found that negative repetitively pulsed biasing of the substrate significantly reduced the MPs content on surface. Several different physical mechanisms for the MPs decreasing have been identified. It was established that up to 10% of the MPs are repelled by the sheath electric field. Reduction of MPs density by almost 20% is attributable to ion sputtering after 2 min of processing. It was found that enhanced ion sputtering, MPs evaporation on substrate surface, and even evaporation of MPs in a sheath, can take place depending on the cathode material and the irradiation parameters.
UR - http://www.scopus.com/inward/record.url?scp=84903273981&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84903273981&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2014.05.101
DO - 10.1016/j.apsusc.2014.05.101
M3 - Article
VL - 310
SP - 115
EP - 119
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
ER -