Repetitively pulsed vacuum arc ion and plasma sources and new methods of ion and ion-plasma treatment of materials

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Abstract

A brief review is presented of the "Raduga 1-5" repetitively pulsed vacuum arc ion sources. Their operating principles and functional ranges are described. The Raduga ion sources provide single-and multi-element implantation. These advantages are achieved by using not only pure single-element or mixed ion beams, but also pulsed beam sequences with controllable composition and energy of each ion species. Another feature of the ion sources is their ability to generate a sequence of ion beam and plasma stream pulses. Switching between ion implantation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. "Raduga 5" ion and plasma source operates in a d.c. mode of plasma formation and repetitively pulsed mode of ion beam generation. A new simple and effective system for filtering a plasma flux from the microparticle fraction and the neutral component is described.

Original languageEnglish
Pages (from-to)9-15
Number of pages7
JournalSurface and Coatings Technology
Volume96
Issue number1
Publication statusPublished - 3 Nov 1997

Fingerprint

Plasma sources
Ion sources
ion sources
arcs
Vacuum
Ions
Ion beams
Plasmas
vacuum
Ion implantation
ion beams
ions
pulses
Plasma deposition
microparticles
ion implantation
Fluxes
implantation
dosage
Chemical analysis

Keywords

  • Ion and plasma sources
  • Ion implantation
  • Plasma deposition of coatings
  • Vacuum arc

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

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AB - A brief review is presented of the "Raduga 1-5" repetitively pulsed vacuum arc ion sources. Their operating principles and functional ranges are described. The Raduga ion sources provide single-and multi-element implantation. These advantages are achieved by using not only pure single-element or mixed ion beams, but also pulsed beam sequences with controllable composition and energy of each ion species. Another feature of the ion sources is their ability to generate a sequence of ion beam and plasma stream pulses. Switching between ion implantation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. "Raduga 5" ion and plasma source operates in a d.c. mode of plasma formation and repetitively pulsed mode of ion beam generation. A new simple and effective system for filtering a plasma flux from the microparticle fraction and the neutral component is described.

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