Repetitively pulsed vacuum arc ion and plasma sources and new methods of ion and ion-plasma treatment of materials

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Abstract

A brief review is presented of the "Raduga 1-5" repetitively pulsed vacuum arc ion sources. Their operating principles and functional ranges are described. The Raduga ion sources provide single-and multi-element implantation. These advantages are achieved by using not only pure single-element or mixed ion beams, but also pulsed beam sequences with controllable composition and energy of each ion species. Another feature of the ion sources is their ability to generate a sequence of ion beam and plasma stream pulses. Switching between ion implantation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. "Raduga 5" ion and plasma source operates in a d.c. mode of plasma formation and repetitively pulsed mode of ion beam generation. A new simple and effective system for filtering a plasma flux from the microparticle fraction and the neutral component is described.

Original languageEnglish
Pages (from-to)9-15
Number of pages7
JournalSurface and Coatings Technology
Volume96
Issue number1
Publication statusPublished - 3 Nov 1997

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Keywords

  • Ion and plasma sources
  • Ion implantation
  • Plasma deposition of coatings
  • Vacuum arc

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

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