Reactive magnetron sputtering of TiOx films

P. Baroch, J. Musil, J. Vlcek, K. H. Nam, J. G. Han

Research output: Contribution to journalArticle

69 Citations (Scopus)

Abstract

This article reports on the hysteresis effect in synthesis of TiOx films prepared by a single magnetron (SM) and dual magnetron (DM), the development of deposition rate aD and elemental and phase composition of these films with increasing partial pressure of oxygen pO2. It was shown that: (1) when a control of the oxygen flow rate φO2 is used, a jump decrease in aD occurs at a critical value of φO2, which corresponds to a transition from the metallic to the oxide mode of sputtering; (2) TiOx films deposited in the metallic mode are opaque while those deposited in the transition and oxide modes are transparent; (3) TiOx films sputtered in the oxide mode are almost stoichiometric and exhibit a well-crystallized structure when both the SM and DM sputtering system are used; (4) 400-nm-thick films prepared by the SM exhibit an X-ray amorphous structure; and (5) the transparent stoichiometric TiOx≈2 films can be sputtered in the transition mode at a high deposition rate aD TiOx≈2=31.5 nm/min achieving up to 77% of that of the pure Ti film, i.e., aD TiO2=0.77 aD Ti, if the DM with a control of pO2 is used.

Original languageEnglish
Pages (from-to)107-111
Number of pages5
JournalSurface and Coatings Technology
Volume193
Issue number1-3 SPEC. ISS.
DOIs
Publication statusPublished - 1 Apr 2005

Fingerprint

Reactive sputtering
Magnetron sputtering
magnetron sputtering
Oxides
Deposition rates
oxides
Oxygen
oxygen
Thick films
Phase composition
Partial pressure
thick films
Sputtering
partial pressure
Hysteresis
flow velocity
sputtering
hysteresis
Flow rate
X rays

Keywords

  • Deposition rate
  • Dual magnetron
  • Hysteresis effect
  • Phase composition
  • Reactive sputtering
  • TiO films

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Baroch, P., Musil, J., Vlcek, J., Nam, K. H., & Han, J. G. (2005). Reactive magnetron sputtering of TiOx films. Surface and Coatings Technology, 193(1-3 SPEC. ISS.), 107-111. https://doi.org/10.1016/j.surfcoat.2004.07.060

Reactive magnetron sputtering of TiOx films. / Baroch, P.; Musil, J.; Vlcek, J.; Nam, K. H.; Han, J. G.

In: Surface and Coatings Technology, Vol. 193, No. 1-3 SPEC. ISS., 01.04.2005, p. 107-111.

Research output: Contribution to journalArticle

Baroch, P, Musil, J, Vlcek, J, Nam, KH & Han, JG 2005, 'Reactive magnetron sputtering of TiOx films', Surface and Coatings Technology, vol. 193, no. 1-3 SPEC. ISS., pp. 107-111. https://doi.org/10.1016/j.surfcoat.2004.07.060
Baroch, P. ; Musil, J. ; Vlcek, J. ; Nam, K. H. ; Han, J. G. / Reactive magnetron sputtering of TiOx films. In: Surface and Coatings Technology. 2005 ; Vol. 193, No. 1-3 SPEC. ISS. pp. 107-111.
@article{2f640a4e5410480c95922039d5461552,
title = "Reactive magnetron sputtering of TiOx films",
abstract = "This article reports on the hysteresis effect in synthesis of TiOx films prepared by a single magnetron (SM) and dual magnetron (DM), the development of deposition rate aD and elemental and phase composition of these films with increasing partial pressure of oxygen pO2. It was shown that: (1) when a control of the oxygen flow rate φO2 is used, a jump decrease in aD occurs at a critical value of φO2, which corresponds to a transition from the metallic to the oxide mode of sputtering; (2) TiOx films deposited in the metallic mode are opaque while those deposited in the transition and oxide modes are transparent; (3) TiOx films sputtered in the oxide mode are almost stoichiometric and exhibit a well-crystallized structure when both the SM and DM sputtering system are used; (4) 400-nm-thick films prepared by the SM exhibit an X-ray amorphous structure; and (5) the transparent stoichiometric TiOx≈2 films can be sputtered in the transition mode at a high deposition rate aD TiOx≈2=31.5 nm/min achieving up to 77{\%} of that of the pure Ti film, i.e., aD TiO2=0.77 aD Ti, if the DM with a control of pO2 is used.",
keywords = "Deposition rate, Dual magnetron, Hysteresis effect, Phase composition, Reactive sputtering, TiO films",
author = "P. Baroch and J. Musil and J. Vlcek and Nam, {K. H.} and Han, {J. G.}",
year = "2005",
month = "4",
day = "1",
doi = "10.1016/j.surfcoat.2004.07.060",
language = "English",
volume = "193",
pages = "107--111",
journal = "Surface and Coatings Technology",
issn = "0257-8972",
publisher = "Elsevier",
number = "1-3 SPEC. ISS.",

}

TY - JOUR

T1 - Reactive magnetron sputtering of TiOx films

AU - Baroch, P.

AU - Musil, J.

AU - Vlcek, J.

AU - Nam, K. H.

AU - Han, J. G.

PY - 2005/4/1

Y1 - 2005/4/1

N2 - This article reports on the hysteresis effect in synthesis of TiOx films prepared by a single magnetron (SM) and dual magnetron (DM), the development of deposition rate aD and elemental and phase composition of these films with increasing partial pressure of oxygen pO2. It was shown that: (1) when a control of the oxygen flow rate φO2 is used, a jump decrease in aD occurs at a critical value of φO2, which corresponds to a transition from the metallic to the oxide mode of sputtering; (2) TiOx films deposited in the metallic mode are opaque while those deposited in the transition and oxide modes are transparent; (3) TiOx films sputtered in the oxide mode are almost stoichiometric and exhibit a well-crystallized structure when both the SM and DM sputtering system are used; (4) 400-nm-thick films prepared by the SM exhibit an X-ray amorphous structure; and (5) the transparent stoichiometric TiOx≈2 films can be sputtered in the transition mode at a high deposition rate aD TiOx≈2=31.5 nm/min achieving up to 77% of that of the pure Ti film, i.e., aD TiO2=0.77 aD Ti, if the DM with a control of pO2 is used.

AB - This article reports on the hysteresis effect in synthesis of TiOx films prepared by a single magnetron (SM) and dual magnetron (DM), the development of deposition rate aD and elemental and phase composition of these films with increasing partial pressure of oxygen pO2. It was shown that: (1) when a control of the oxygen flow rate φO2 is used, a jump decrease in aD occurs at a critical value of φO2, which corresponds to a transition from the metallic to the oxide mode of sputtering; (2) TiOx films deposited in the metallic mode are opaque while those deposited in the transition and oxide modes are transparent; (3) TiOx films sputtered in the oxide mode are almost stoichiometric and exhibit a well-crystallized structure when both the SM and DM sputtering system are used; (4) 400-nm-thick films prepared by the SM exhibit an X-ray amorphous structure; and (5) the transparent stoichiometric TiOx≈2 films can be sputtered in the transition mode at a high deposition rate aD TiOx≈2=31.5 nm/min achieving up to 77% of that of the pure Ti film, i.e., aD TiO2=0.77 aD Ti, if the DM with a control of pO2 is used.

KW - Deposition rate

KW - Dual magnetron

KW - Hysteresis effect

KW - Phase composition

KW - Reactive sputtering

KW - TiO films

UR - http://www.scopus.com/inward/record.url?scp=13844266287&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=13844266287&partnerID=8YFLogxK

U2 - 10.1016/j.surfcoat.2004.07.060

DO - 10.1016/j.surfcoat.2004.07.060

M3 - Article

VL - 193

SP - 107

EP - 111

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

SN - 0257-8972

IS - 1-3 SPEC. ISS.

ER -