Abstract
This paper gives a critical review of the present state of the knowledge in the field of dc reactive magnetron sputtering of compound films. It analyses (i) the hysteresis effect and the methods of its elimination, (ii) problem of stability of reactive sputtering and (iii) deposition of transparent oxides in the transition mode of sputtering. It shows the conditions under which oxides are reactively sputtered with high deposition rates aD oxide achieving up to approximately 77% of that of a pure metal aD Me, i.e. aD oxide/aD Me≈0.77. A special attention is devoted to the elimination of arcing in sputtering of insulating films using pulsed dual magnetron or sputtering of oxides from a substoichiometric target. Also, the ion bombardment of films growing on insulatings or unbiased substrates in dc pulsed magnetron sputtering is discussed in detail. As an example, a new possibility to form superhard single-phase films based on solid solutions using dc reactive magnetron sputtering is shown. At the end, future trends in dc reactive magnetron sputtering are outlined.
| Original language | English |
|---|---|
| Pages (from-to) | 208-218 |
| Number of pages | 11 |
| Journal | Thin Solid Films |
| Volume | 475 |
| Issue number | 1-2 SPEC. ISS. |
| DOIs | |
| Publication status | Published - 22 Mar 2005 |
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Keywords
- Compounds
- DC continuous and pulsed reactive magnetron sputtering
- Deposition rate
- Film properties
- Nanocomposites
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Metals and Alloys
- Materials Chemistry
Cite this
Reactive magnetron sputtering of thin films : Present status and trends. / Musil, J.; Baroch, P.; Vlček, J.; Nam, K. H.; Han, J. G.
In: Thin Solid Films, Vol. 475, No. 1-2 SPEC. ISS., 22.03.2005, p. 208-218.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Reactive magnetron sputtering of thin films
T2 - Present status and trends
AU - Musil, J.
AU - Baroch, P.
AU - Vlček, J.
AU - Nam, K. H.
AU - Han, J. G.
PY - 2005/3/22
Y1 - 2005/3/22
N2 - This paper gives a critical review of the present state of the knowledge in the field of dc reactive magnetron sputtering of compound films. It analyses (i) the hysteresis effect and the methods of its elimination, (ii) problem of stability of reactive sputtering and (iii) deposition of transparent oxides in the transition mode of sputtering. It shows the conditions under which oxides are reactively sputtered with high deposition rates aD oxide achieving up to approximately 77% of that of a pure metal aD Me, i.e. aD oxide/aD Me≈0.77. A special attention is devoted to the elimination of arcing in sputtering of insulating films using pulsed dual magnetron or sputtering of oxides from a substoichiometric target. Also, the ion bombardment of films growing on insulatings or unbiased substrates in dc pulsed magnetron sputtering is discussed in detail. As an example, a new possibility to form superhard single-phase films based on solid solutions using dc reactive magnetron sputtering is shown. At the end, future trends in dc reactive magnetron sputtering are outlined.
AB - This paper gives a critical review of the present state of the knowledge in the field of dc reactive magnetron sputtering of compound films. It analyses (i) the hysteresis effect and the methods of its elimination, (ii) problem of stability of reactive sputtering and (iii) deposition of transparent oxides in the transition mode of sputtering. It shows the conditions under which oxides are reactively sputtered with high deposition rates aD oxide achieving up to approximately 77% of that of a pure metal aD Me, i.e. aD oxide/aD Me≈0.77. A special attention is devoted to the elimination of arcing in sputtering of insulating films using pulsed dual magnetron or sputtering of oxides from a substoichiometric target. Also, the ion bombardment of films growing on insulatings or unbiased substrates in dc pulsed magnetron sputtering is discussed in detail. As an example, a new possibility to form superhard single-phase films based on solid solutions using dc reactive magnetron sputtering is shown. At the end, future trends in dc reactive magnetron sputtering are outlined.
KW - Compounds
KW - DC continuous and pulsed reactive magnetron sputtering
KW - Deposition rate
KW - Film properties
KW - Nanocomposites
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UR - http://www.scopus.com/inward/citedby.url?scp=13444266367&partnerID=8YFLogxK
U2 - 10.1016/j.tsf.2004.07.041
DO - 10.1016/j.tsf.2004.07.041
M3 - Article
AN - SCOPUS:13444266367
VL - 475
SP - 208
EP - 218
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
IS - 1-2 SPEC. ISS.
ER -