Pulsed dc magnetron discharge for high-rate sputtering of thin films

J. Musil, J. Leština, J. Vlček, T. Tölg

Research School of High-Energy Physics

Research output: Contribution to journal › Article › peer-review

Abstract

The performance of pulsed magnetron sputtering was compared with dc magnetron in the deposition of Cu films. The pulsed magnetron discharge characteristics were investigated. The discharges were found to depend on the pulse length of the repetition frequency, the pulse power delivered to the magnetron, and the operating pressure.

Original language	English
Pages (from-to)	420-424
Number of pages	5
Journal	Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume	19
Issue number	2
DOIs	https://doi.org/10.1116/1.1339018
Publication status	Published - 1 Mar 2001

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1116/1.1339018

Fingerprint Dive into the research topics of 'Pulsed dc magnetron discharge for high-rate sputtering of thin films'. Together they form a unique fingerprint.

Cite this

@article{d147a75e3ab846adaddf6cbb1b82ed28,

title = "Pulsed dc magnetron discharge for high-rate sputtering of thin films",

abstract = "The performance of pulsed magnetron sputtering was compared with dc magnetron in the deposition of Cu films. The pulsed magnetron discharge characteristics were investigated. The discharges were found to depend on the pulse length of the repetition frequency, the pulse power delivered to the magnetron, and the operating pressure.",

author = "J. Musil and J. Le{\v s}tina and J. Vl{\v c}ek and T. T{\"o}lg",

year = "2001",

month = mar,

day = "1",

doi = "10.1116/1.1339018",

language = "English",

volume = "19",

pages = "420--424",

journal = "Journal of Vacuum Science and Technology A",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "2",

}

TY - JOUR

T1 - Pulsed dc magnetron discharge for high-rate sputtering of thin films

AU - Musil, J.

AU - Leština, J.

AU - Vlček, J.

AU - Tölg, T.

PY - 2001/3/1

Y1 - 2001/3/1

N2 - The performance of pulsed magnetron sputtering was compared with dc magnetron in the deposition of Cu films. The pulsed magnetron discharge characteristics were investigated. The discharges were found to depend on the pulse length of the repetition frequency, the pulse power delivered to the magnetron, and the operating pressure.

AB - The performance of pulsed magnetron sputtering was compared with dc magnetron in the deposition of Cu films. The pulsed magnetron discharge characteristics were investigated. The discharges were found to depend on the pulse length of the repetition frequency, the pulse power delivered to the magnetron, and the operating pressure.

UR - http://www.scopus.com/inward/record.url?scp=0035271894&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035271894&partnerID=8YFLogxK

U2 - 10.1116/1.1339018

DO - 10.1116/1.1339018

M3 - Article

AN - SCOPUS:0035271894

VL - 19

SP - 420

EP - 424

JO - Journal of Vacuum Science and Technology A

JF - Journal of Vacuum Science and Technology A

SN - 0734-2101

IS - 2

ER -