Abstract
The performance of pulsed magnetron sputtering was compared with dc magnetron in the deposition of Cu films. The pulsed magnetron discharge characteristics were investigated. The discharges were found to depend on the pulse length of the repetition frequency, the pulse power delivered to the magnetron, and the operating pressure.
| Original language | English |
|---|---|
| Pages (from-to) | 420-424 |
| Number of pages | 5 |
| Journal | Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films |
| Volume | 19 |
| Issue number | 2 |
| DOIs | |
| Publication status | Published - 1 Mar 2001 |
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ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
Cite this
Pulsed dc magnetron discharge for high-rate sputtering of thin films. / Musil, J.; Leština, J.; Vlček, J.; Tölg, T.
In: Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films, Vol. 19, No. 2, 01.03.2001, p. 420-424.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Pulsed dc magnetron discharge for high-rate sputtering of thin films
AU - Musil, J.
AU - Leština, J.
AU - Vlček, J.
AU - Tölg, T.
PY - 2001/3/1
Y1 - 2001/3/1
N2 - The performance of pulsed magnetron sputtering was compared with dc magnetron in the deposition of Cu films. The pulsed magnetron discharge characteristics were investigated. The discharges were found to depend on the pulse length of the repetition frequency, the pulse power delivered to the magnetron, and the operating pressure.
AB - The performance of pulsed magnetron sputtering was compared with dc magnetron in the deposition of Cu films. The pulsed magnetron discharge characteristics were investigated. The discharges were found to depend on the pulse length of the repetition frequency, the pulse power delivered to the magnetron, and the operating pressure.
UR - http://www.scopus.com/inward/record.url?scp=0035271894&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=0035271894&partnerID=8YFLogxK
U2 - 10.1116/1.1339018
DO - 10.1116/1.1339018
M3 - Article
AN - SCOPUS:0035271894
VL - 19
SP - 420
EP - 424
JO - Journal of Vacuum Science and Technology A
JF - Journal of Vacuum Science and Technology A
SN - 0734-2101
IS - 2
ER -