Pulsed dc magnetron discharge for high-rate sputtering of thin films

J. Musil, J. Leština, J. Vlček, T. Tölg

Research School of High-Energy Physics

Research output: Contribution to journal › Article › peer-review

Abstract

The performance of pulsed magnetron sputtering was compared with dc magnetron in the deposition of Cu films. The pulsed magnetron discharge characteristics were investigated. The discharges were found to depend on the pulse length of the repetition frequency, the pulse power delivered to the magnetron, and the operating pressure.

Original language	English
Pages (from-to)	420-424
Number of pages	5
Journal	Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume	19
Issue number	2
DOIs	https://doi.org/10.1116/1.1339018
Publication status	Published - 1 Mar 2001

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films

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abstract = "The performance of pulsed magnetron sputtering was compared with dc magnetron in the deposition of Cu films. The pulsed magnetron discharge characteristics were investigated. The discharges were found to depend on the pulse length of the repetition frequency, the pulse power delivered to the magnetron, and the operating pressure.",

author = "J. Musil and J. Le{\v s}tina and J. Vl{\v c}ek and T. T{\"o}lg",

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Pulsed dc magnetron discharge for high-rate sputtering of thin films

Abstract

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