Pulse-periodical high-intensity ion sources for multielement implantation

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27 Citations (Scopus)

Abstract

In this paper we present results on the formation of multicomponent ion beams with controlled composition for ion implantation. The principles of control of the beam composition and energy are formulated by consideration of the requirements of beams for multielement ion implantation. It is shown that variation of the composition and energy can be obtained by repetitively pulsed beam formation with spatial separation of the different components. Results are presented of different versions of our high current ion sources, and of the means for controlling the beam composition and energy on a pulse-to-pulse basis and also within each pulse.

Original languageEnglish
Pages (from-to)641-643
Number of pages3
JournalReview of Scientific Instruments
Volume61
Issue number1
DOIs
Publication statusPublished - 1 Dec 1990

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Ion sources
Ion implantation
ion sources
implantation
pulses
Chemical analysis
ion implantation
Ion beams
high current
energy
ion beams
requirements

ASJC Scopus subject areas

  • Instrumentation

Cite this

Pulse-periodical high-intensity ion sources for multielement implantation. / Ryabchikov, A. I.

In: Review of Scientific Instruments, Vol. 61, No. 1, 01.12.1990, p. 641-643.

Research output: Contribution to journalArticle

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