Abstract
In this paper we present results on the formation of multicomponent ion beams with controlled composition for ion implantation. The principles of control of the beam composition and energy are formulated by consideration of the requirements of beams for multielement ion implantation. It is shown that variation of the composition and energy can be obtained by repetitively pulsed beam formation with spatial separation of the different components. Results are presented of different versions of our high current ion sources, and of the means for controlling the beam composition and energy on a pulse-to-pulse basis and also within each pulse.
| Original language | English |
|---|---|
| Pages (from-to) | 641-643 |
| Number of pages | 3 |
| Journal | Review of Scientific Instruments |
| Volume | 61 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 1 Dec 1990 |
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ASJC Scopus subject areas
- Instrumentation
Cite this
Pulse-periodical high-intensity ion sources for multielement implantation. / Ryabchikov, A. I.
In: Review of Scientific Instruments, Vol. 61, No. 1, 01.12.1990, p. 641-643.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Pulse-periodical high-intensity ion sources for multielement implantation
AU - Ryabchikov, A. I.
PY - 1990/12/1
Y1 - 1990/12/1
N2 - In this paper we present results on the formation of multicomponent ion beams with controlled composition for ion implantation. The principles of control of the beam composition and energy are formulated by consideration of the requirements of beams for multielement ion implantation. It is shown that variation of the composition and energy can be obtained by repetitively pulsed beam formation with spatial separation of the different components. Results are presented of different versions of our high current ion sources, and of the means for controlling the beam composition and energy on a pulse-to-pulse basis and also within each pulse.
AB - In this paper we present results on the formation of multicomponent ion beams with controlled composition for ion implantation. The principles of control of the beam composition and energy are formulated by consideration of the requirements of beams for multielement ion implantation. It is shown that variation of the composition and energy can be obtained by repetitively pulsed beam formation with spatial separation of the different components. Results are presented of different versions of our high current ion sources, and of the means for controlling the beam composition and energy on a pulse-to-pulse basis and also within each pulse.
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UR - http://www.scopus.com/inward/citedby.url?scp=36549098245&partnerID=8YFLogxK
U2 - 10.1063/1.1141945
DO - 10.1063/1.1141945
M3 - Article
AN - SCOPUS:36549098245
VL - 61
SP - 641
EP - 643
JO - Review of Scientific Instruments
JF - Review of Scientific Instruments
SN - 0034-6748
IS - 1
ER -