In this paper we present results on the formation of multicomponent ion beams with controlled composition for ion implantation. The principles of control of the beam composition and energy are formulated by consideration of the requirements of beams for multielement ion implantation. It is shown that variation of the composition and energy can be obtained by repetitively pulsed beam formation with spatial separation of the different components. Results are presented of different versions of our high current ion sources, and of the means for controlling the beam composition and energy on a pulse-to-pulse basis and also within each pulse.
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