Properties of ZnO:Al, ZnO:Al–SiO2 Films Obtained in Sol Gel Process from Coating Solutions

S. A. Kuznetsova, A. G. Mal’chik, V. V. Kozik

    Research output: Contribution to journalArticle

    Abstract

    The paper deals with ZnO, ZnO:Al 5 wt.% and ZnO:Al 5 wt.% – SiO2 5 wt.% thin films obtained on glass substrates by the sol gel process from film-forming solutions Zn[C6H4OHCOO]NO3, Al(NO3)3·9H2O and Si(OC2H5)4. The film properties such as transmission in the visible region, surface resistance and photocatalysis are investigated. It is shown that the aluminum addition has no effect on the ZnO film transmission in the visible region, but improves the film conductivity through the decrease in the surface resistance down to 107 Ohm. The ZnO:Al – SiO2 film has the highest transmission of 95%. The addition of SiO2 has no effect on the ZnO:Al film transmission. The maximum photocatalytic activity is observed in the ZnO:Al film. The photodecomposition velocity of methyl orange is 1.47 ∙10–2 min–1, that is by one order higher as compared to that in the presence of Degussa P25 adsorptive photocatalyst. The SiO2 addition lowers the degree of crystallinity of the ZnO:Al film and its photocatalytic activity.

    Original languageEnglish
    Pages (from-to)591-598
    Number of pages8
    JournalRussian Physics Journal
    Volume63
    Issue number4
    DOIs
    Publication statusPublished - 1 Aug 2020

    Keywords

    • photocatalysis of organic dyes
    • surface morphology
    • surface resistance
    • transparent film
    • ZnO:Al
    • ZnO:Al–SiO films

    ASJC Scopus subject areas

    • Physics and Astronomy(all)

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