Properties of WS2 films prepared by magnetron sputtering from a nanostructured target

Y. Irtegov, V. An, P. Vinatier, N. Sochugov, A. Zakharov

Research output: Chapter in Book/Report/Conference proceedingConference contribution

3 Citations (Scopus)

Abstract

Tungsten disulfide films were prepared by magnetron sputtering from a laboratory and a nanostructured targets. The nanostructured target was produced from WS2 nanolamellar particles prepared by self-propagating high-temperature synthesis in argon. The main phase in the films was 2H-WS2. According to the X-ray analysis, the films sputtered from the laboratory target and from the nanostructured one reveal different planes of film growth orientation.

Original languageEnglish
Title of host publicationAdvanced Materials Research
Pages197-200
Number of pages4
Volume872
DOIs
Publication statusPublished - 2014
EventRussian-German Forum on Nanotechnology - Tomsk, Russian Federation
Duration: 21 May 201324 May 2013

Publication series

NameAdvanced Materials Research
Volume872
ISSN (Print)10226680

Other

OtherRussian-German Forum on Nanotechnology
CountryRussian Federation
CityTomsk
Period21.5.1324.5.13

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Keywords

  • Magnetron sputtering
  • Thin films
  • Tungsten disulfide

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Irtegov, Y., An, V., Vinatier, P., Sochugov, N., & Zakharov, A. (2014). Properties of WS2 films prepared by magnetron sputtering from a nanostructured target. In Advanced Materials Research (Vol. 872, pp. 197-200). (Advanced Materials Research; Vol. 872). https://doi.org/10.4028/www.scientific.net/AMR.872.197