Properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering method

V. V. An, V. M. Pogrebenkov, A. N. Zakharov

Research output: Contribution to journalArticle

Abstract

This article describes investigations into the properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering on glass substrates in argon atmosphere. Transmittance spectra of the obtained films are studied by spectrophotometry in the range from 300 to 900 nm; the band gaps are determined. The thickness of the obtained films varies in the range of 0.5–1 μm.

Original languageEnglish
Pages (from-to)166-171
Number of pages6
JournalInorganic Materials: Applied Research
Volume8
Issue number1
DOIs
Publication statusPublished - 1 Jan 2017

Fingerprint

Tungsten
Sulfides
Magnetron sputtering
Copper
Thin films
Argon
Spectrophotometry
Energy gap
Glass
Substrates

Keywords

  • copper sulfide
  • nanostructured target
  • sputter deposition
  • thin film
  • tungsten sulfide

ASJC Scopus subject areas

  • Materials Science(all)
  • Engineering(all)

Cite this

Properties of thin films of tungsten sulfide and copper sulfide produced by magnetron sputtering method. / An, V. V.; Pogrebenkov, V. M.; Zakharov, A. N.

In: Inorganic Materials: Applied Research, Vol. 8, No. 1, 01.01.2017, p. 166-171.

Research output: Contribution to journalArticle

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