Production of silicon from magnesium silicide

V. M. Borshchev, A. N. D'Yachenko, A. D. Kiselev, R. I. Kraidenko

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

Abstract

Kinetic methods and thermogravimetry were used to study the oxidation process of magnesium silicide in air in the temperature range 300-1000 C. The reaction products were identified by X-ray phase analysis. It was found that the reaction occurs in the temperature range 510-710 C to give silicon and magnesium oxide. With the temperature increasing further, silicon is oxidized to silicon dioxide.

Original languageEnglish
Pages (from-to)493-497
Number of pages5
JournalRussian Journal of Applied Chemistry
Volume86
Issue number4
DOIs
Publication statusPublished - Apr 2013

ASJC Scopus subject areas

  • Chemistry(all)
  • Chemical Engineering(all)

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