Abstract
This paper presents new results on investigation of the influence of Au- negative ion beam implantation and thermal annealing at 900°C and 1300°C on the structure and characteristics of AlN-TiB2-TiSi2 coatings prepared by magnetron sputtering. Using a scanning electron microscope (SEM) with microanalysis (EDS), X-ray diffraction (XRD), high-resolution transmission electron microscopy (HRTEM), the crystal structure, surface topography, and the microstructure were characterized.
Original language | English |
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Pages (from-to) | 189-200 |
Number of pages | 12 |
Journal | High Temperature Material Processes |
Volume | 19 |
Issue number | 2 |
DOIs | |
Publication status | Published - 1 Jan 2015 |
Externally published | Yes |
Keywords
- Annealing
- Implantation
- Magnetron sputtering
ASJC Scopus subject areas
- Materials Science(all)
- Condensed Matter Physics
- Energy Engineering and Power Technology
- Engineering(all)
- Spectroscopy
- Physical and Theoretical Chemistry