Preparation of ultrafine Cu3Si in high-current pulsed arc discharge

A. Ya Pak, K. N. Shatrova, N. E. Aktaev, A. S. Ivashutenko

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The results of experimental research into ultrafine copper silicide production in plasma high-current pulsed arc discharge are shown. According to X-ray diffraction, the product consists primarily of η″-Cu3Si (81%) and contains copper and silicon. A study of the material by transmission electron microscopy reveals the formation of elongated pointed copper silicide crystals with cross-sectional dimensions of approximately 250 nm. The presented method of preparation of copper silicide allow one to obtain grams of the ultrafine product per one operating cycle of the system, the duration of which is about 0.5 ms. The materials prepared may be used in the power industry, for example, for the manufacture of electrode systems of power supplies.

Original languageEnglish
Pages (from-to)548-552
Number of pages5
JournalNanotechnologies in Russia
Volume11
Issue number9-10
DOIs
Publication statusPublished - 1 Sep 2016

Fingerprint

arc discharges
high current
Copper
copper
preparation
Silicon
products
power supplies
industries
Transmission electron microscopy
Plasmas
X ray diffraction
transmission electron microscopy
Crystals
cycles
Electrodes
electrodes
Ultrafine
silicon
diffraction

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Engineering(all)

Cite this

Preparation of ultrafine Cu3Si in high-current pulsed arc discharge. / Pak, A. Ya; Shatrova, K. N.; Aktaev, N. E.; Ivashutenko, A. S.

In: Nanotechnologies in Russia, Vol. 11, No. 9-10, 01.09.2016, p. 548-552.

Research output: Contribution to journalArticle

Pak, A. Ya ; Shatrova, K. N. ; Aktaev, N. E. ; Ivashutenko, A. S. / Preparation of ultrafine Cu3Si in high-current pulsed arc discharge. In: Nanotechnologies in Russia. 2016 ; Vol. 11, No. 9-10. pp. 548-552.
@article{92845b32d1fc4e55b5596f7f957b498e,
title = "Preparation of ultrafine Cu3Si in high-current pulsed arc discharge",
abstract = "The results of experimental research into ultrafine copper silicide production in plasma high-current pulsed arc discharge are shown. According to X-ray diffraction, the product consists primarily of η″-Cu3Si (81{\%}) and contains copper and silicon. A study of the material by transmission electron microscopy reveals the formation of elongated pointed copper silicide crystals with cross-sectional dimensions of approximately 250 nm. The presented method of preparation of copper silicide allow one to obtain grams of the ultrafine product per one operating cycle of the system, the duration of which is about 0.5 ms. The materials prepared may be used in the power industry, for example, for the manufacture of electrode systems of power supplies.",
author = "Pak, {A. Ya} and Shatrova, {K. N.} and Aktaev, {N. E.} and Ivashutenko, {A. S.}",
year = "2016",
month = "9",
day = "1",
doi = "10.1134/S199507801605013X",
language = "English",
volume = "11",
pages = "548--552",
journal = "Nanotechnologies in Russia",
issn = "1995-0780",
publisher = "Springer Verlag",
number = "9-10",

}

TY - JOUR

T1 - Preparation of ultrafine Cu3Si in high-current pulsed arc discharge

AU - Pak, A. Ya

AU - Shatrova, K. N.

AU - Aktaev, N. E.

AU - Ivashutenko, A. S.

PY - 2016/9/1

Y1 - 2016/9/1

N2 - The results of experimental research into ultrafine copper silicide production in plasma high-current pulsed arc discharge are shown. According to X-ray diffraction, the product consists primarily of η″-Cu3Si (81%) and contains copper and silicon. A study of the material by transmission electron microscopy reveals the formation of elongated pointed copper silicide crystals with cross-sectional dimensions of approximately 250 nm. The presented method of preparation of copper silicide allow one to obtain grams of the ultrafine product per one operating cycle of the system, the duration of which is about 0.5 ms. The materials prepared may be used in the power industry, for example, for the manufacture of electrode systems of power supplies.

AB - The results of experimental research into ultrafine copper silicide production in plasma high-current pulsed arc discharge are shown. According to X-ray diffraction, the product consists primarily of η″-Cu3Si (81%) and contains copper and silicon. A study of the material by transmission electron microscopy reveals the formation of elongated pointed copper silicide crystals with cross-sectional dimensions of approximately 250 nm. The presented method of preparation of copper silicide allow one to obtain grams of the ultrafine product per one operating cycle of the system, the duration of which is about 0.5 ms. The materials prepared may be used in the power industry, for example, for the manufacture of electrode systems of power supplies.

UR - http://www.scopus.com/inward/record.url?scp=84991829798&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84991829798&partnerID=8YFLogxK

U2 - 10.1134/S199507801605013X

DO - 10.1134/S199507801605013X

M3 - Article

VL - 11

SP - 548

EP - 552

JO - Nanotechnologies in Russia

JF - Nanotechnologies in Russia

SN - 1995-0780

IS - 9-10

ER -