Preparation and characterization of titanium oxy-nitride thin films

M. Braic, M. Balaceanu, A. Vladescu, A. Kiss, V. Braic, G. Epurescu, G. Dinescu, A. Moldovan, R. Birjega, M. Dinescu

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61 Citations (Scopus)

Abstract

The interest in TiN x O y films has increased recently due to their properties dependence on the N/O ratio. In this work, we studied comparatively the influence of different flow rate ratios of the reactive gases (O 2 and N 2 ) on the properties of the TiN x O y films deposited by two different methods: rf pulsed laser deposition (rf PLD) and reactive pulsed magnetron sputtering (RPM). Film structure and composition were studied by XRD and XPS methods, while film surface morphology was analyzed with AFM. Mechanical characteristics as Vickers microhardness and adhesion (scratch tests) were also determined.

Original languageEnglish
Pages (from-to)8210-8214
Number of pages5
JournalApplied Surface Science
Volume253
Issue number19
DOIs
Publication statusPublished - 31 Jul 2007
Externally publishedYes

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Keywords

  • Microchemical and mechanical properties
  • Physical
  • Ti oxy-nitride

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Physics and Astronomy(all)
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Braic, M., Balaceanu, M., Vladescu, A., Kiss, A., Braic, V., Epurescu, G., ... Dinescu, M. (2007). Preparation and characterization of titanium oxy-nitride thin films. Applied Surface Science, 253(19), 8210-8214. https://doi.org/10.1016/j.apsusc.2007.02.179