Abstract
The interest in TiN x O y films has increased recently due to their properties dependence on the N/O ratio. In this work, we studied comparatively the influence of different flow rate ratios of the reactive gases (O 2 and N 2 ) on the properties of the TiN x O y films deposited by two different methods: rf pulsed laser deposition (rf PLD) and reactive pulsed magnetron sputtering (RPM). Film structure and composition were studied by XRD and XPS methods, while film surface morphology was analyzed with AFM. Mechanical characteristics as Vickers microhardness and adhesion (scratch tests) were also determined.
| Original language | English |
|---|---|
| Pages (from-to) | 8210-8214 |
| Number of pages | 5 |
| Journal | Applied Surface Science |
| Volume | 253 |
| Issue number | 19 |
| DOIs | |
| Publication status | Published - 31 Jul 2007 |
| Externally published | Yes |
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Keywords
- Microchemical and mechanical properties
- Physical
- Ti oxy-nitride
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Physics and Astronomy(all)
- Surfaces and Interfaces
- Surfaces, Coatings and Films
Cite this
Preparation and characterization of titanium oxy-nitride thin films. / Braic, M.; Balaceanu, M.; Vladescu, A.; Kiss, A.; Braic, V.; Epurescu, G.; Dinescu, G.; Moldovan, A.; Birjega, R.; Dinescu, M.
In: Applied Surface Science, Vol. 253, No. 19, 31.07.2007, p. 8210-8214.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Preparation and characterization of titanium oxy-nitride thin films
AU - Braic, M.
AU - Balaceanu, M.
AU - Vladescu, A.
AU - Kiss, A.
AU - Braic, V.
AU - Epurescu, G.
AU - Dinescu, G.
AU - Moldovan, A.
AU - Birjega, R.
AU - Dinescu, M.
PY - 2007/7/31
Y1 - 2007/7/31
N2 - The interest in TiN x O y films has increased recently due to their properties dependence on the N/O ratio. In this work, we studied comparatively the influence of different flow rate ratios of the reactive gases (O 2 and N 2 ) on the properties of the TiN x O y films deposited by two different methods: rf pulsed laser deposition (rf PLD) and reactive pulsed magnetron sputtering (RPM). Film structure and composition were studied by XRD and XPS methods, while film surface morphology was analyzed with AFM. Mechanical characteristics as Vickers microhardness and adhesion (scratch tests) were also determined.
AB - The interest in TiN x O y films has increased recently due to their properties dependence on the N/O ratio. In this work, we studied comparatively the influence of different flow rate ratios of the reactive gases (O 2 and N 2 ) on the properties of the TiN x O y films deposited by two different methods: rf pulsed laser deposition (rf PLD) and reactive pulsed magnetron sputtering (RPM). Film structure and composition were studied by XRD and XPS methods, while film surface morphology was analyzed with AFM. Mechanical characteristics as Vickers microhardness and adhesion (scratch tests) were also determined.
KW - Microchemical and mechanical properties
KW - Physical
KW - Ti oxy-nitride
UR - http://www.scopus.com/inward/record.url?scp=34447295927&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=34447295927&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2007.02.179
DO - 10.1016/j.apsusc.2007.02.179
M3 - Article
VL - 253
SP - 8210
EP - 8214
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
IS - 19
ER -