Preparation and characterization of titanium oxy-nitride thin films

Abstract

The interest in TiN _x O _y films has increased recently due to their properties dependence on the N/O ratio. In this work, we studied comparatively the influence of different flow rate ratios of the reactive gases (O ₂ and N ₂ ) on the properties of the TiN _x O _y films deposited by two different methods: rf pulsed laser deposition (rf PLD) and reactive pulsed magnetron sputtering (RPM). Film structure and composition were studied by XRD and XPS methods, while film surface morphology was analyzed with AFM. Mechanical characteristics as Vickers microhardness and adhesion (scratch tests) were also determined.

Original language	English
Pages (from-to)	8210-8214
Number of pages	5
Journal	Applied Surface Science
Volume	253
Issue number	19
DOIs	https://doi.org/10.1016/j.apsusc.2007.02.179
Publication status	Published - 31 Jul 2007
Externally published	Yes

Keywords

Microchemical and mechanical properties
Physical
Ti oxy-nitride

ASJC Scopus subject areas

Chemistry(all)
Condensed Matter Physics
Physics and Astronomy(all)
Surfaces and Interfaces
Surfaces, Coatings and Films

Access to Document

10.1016/j.apsusc.2007.02.179

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title = "Preparation and characterization of titanium oxy-nitride thin films",

abstract = " The interest in TiN x O y films has increased recently due to their properties dependence on the N/O ratio. In this work, we studied comparatively the influence of different flow rate ratios of the reactive gases (O 2 and N 2 ) on the properties of the TiN x O y films deposited by two different methods: rf pulsed laser deposition (rf PLD) and reactive pulsed magnetron sputtering (RPM). Film structure and composition were studied by XRD and XPS methods, while film surface morphology was analyzed with AFM. Mechanical characteristics as Vickers microhardness and adhesion (scratch tests) were also determined.",

keywords = "Microchemical and mechanical properties, Physical, Ti oxy-nitride",

author = "M. Braic and M. Balaceanu and A. Vladescu and A. Kiss and V. Braic and G. Epurescu and G. Dinescu and A. Moldovan and R. Birjega and M. Dinescu",

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AU - Braic, M.

AU - Balaceanu, M.

AU - Vladescu, A.

AU - Kiss, A.

AU - Braic, V.

AU - Epurescu, G.

AU - Dinescu, G.

AU - Moldovan, A.

AU - Birjega, R.

AU - Dinescu, M.

PY - 2007/7/31

Y1 - 2007/7/31

N2 - The interest in TiN x O y films has increased recently due to their properties dependence on the N/O ratio. In this work, we studied comparatively the influence of different flow rate ratios of the reactive gases (O 2 and N 2 ) on the properties of the TiN x O y films deposited by two different methods: rf pulsed laser deposition (rf PLD) and reactive pulsed magnetron sputtering (RPM). Film structure and composition were studied by XRD and XPS methods, while film surface morphology was analyzed with AFM. Mechanical characteristics as Vickers microhardness and adhesion (scratch tests) were also determined.

AB - The interest in TiN x O y films has increased recently due to their properties dependence on the N/O ratio. In this work, we studied comparatively the influence of different flow rate ratios of the reactive gases (O 2 and N 2 ) on the properties of the TiN x O y films deposited by two different methods: rf pulsed laser deposition (rf PLD) and reactive pulsed magnetron sputtering (RPM). Film structure and composition were studied by XRD and XPS methods, while film surface morphology was analyzed with AFM. Mechanical characteristics as Vickers microhardness and adhesion (scratch tests) were also determined.

KW - Microchemical and mechanical properties

KW - Physical

KW - Ti oxy-nitride

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