TY - JOUR
T1 - Power supply for mid-frequency magnetron sputtering with a wide-range control of pulses parameters
AU - Oskirko, V. O.
AU - Zakharov, A. Z.
AU - Solovyev, A. A.
AU - Pavlov, A. P.
AU - Rabotkin, S. V.
N1 - Funding Information:
The work is performed in the framework of the State task for IHCE SB RAS, project 0366-2016-0010.
Publisher Copyright:
© Published under licence by IOP Publishing Ltd.
Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2020/4/14
Y1 - 2020/4/14
N2 - The paper presents a description of a pulsed power supply of a magnetron sputtering system with a power of 10 kW, which has a wide range of output parameters, such as the amplitude, the frequency, and duration of voltage pulses. High values of the pulse current (up to 100 A) and voltage (up to 1800 V) provide the ability to work at low duty cycle, which in turn allows to increase the value of the ion current on the substrate. It has been experimentally found, that changing the frequency and duration of the pulses can increase the ion current density to the substrate while maintaining the average discharge power.
AB - The paper presents a description of a pulsed power supply of a magnetron sputtering system with a power of 10 kW, which has a wide range of output parameters, such as the amplitude, the frequency, and duration of voltage pulses. High values of the pulse current (up to 100 A) and voltage (up to 1800 V) provide the ability to work at low duty cycle, which in turn allows to increase the value of the ion current on the substrate. It has been experimentally found, that changing the frequency and duration of the pulses can increase the ion current density to the substrate while maintaining the average discharge power.
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U2 - 10.1088/1742-6596/1488/1/012003
DO - 10.1088/1742-6596/1488/1/012003
M3 - Conference article
AN - SCOPUS:85083712237
VL - 1488
JO - Journal of Physics: Conference Series
JF - Journal of Physics: Conference Series
SN - 1742-6588
IS - 1
M1 - 012003
T2 - 2019 International Scientific Conference on Electronic Devices and Control Systems, EDCS 2019
Y2 - 20 November 2019 through 22 November 2019
ER -