The paper presents a description of a pulsed power supply of a magnetron sputtering system with a power of 10 kW, which has a wide range of output parameters, such as the amplitude, the frequency, and duration of voltage pulses. High values of the pulse current (up to 100 A) and voltage (up to 1800 V) provide the ability to work at low duty cycle, which in turn allows to increase the value of the ion current on the substrate. It has been experimentally found, that changing the frequency and duration of the pulses can increase the ion current density to the substrate while maintaining the average discharge power.
|Journal||Journal of Physics: Conference Series|
|Publication status||Published - 14 Apr 2020|
|Event||2019 International Scientific Conference on Electronic Devices and Control Systems, EDCS 2019 - Tomsk, Russian Federation|
Duration: 20 Nov 2019 → 22 Nov 2019
ASJC Scopus subject areas
- Physics and Astronomy(all)