Plasma opening switch operation with microsecond generator

P. S. Ananjin, V. M. Bystritskii, I. B. Ivanov, V. B. Karpov, B. M. Koval'chuk, Y. E. Krasik, I. V. Lisitsyn, E. V. Paul, A. A. Sinebrjukhov, V. G. Tolmatcheva

    Research output: Chapter in Book/Report/Conference proceedingConference contribution

    Abstract

    The results of plasma opening switch (POS) operation with a microsecond 200-kJ inductive store are given. The studies concentrated on the deterioration of the microsecond POS characteristics in comparison with a nanosecond POS and on the optimization of the former for generation of the high-power ion and electron beams. The investigation showed a decrease of the POS impedance with increased time delay between generator firing and the moment of switching and with decreased plasma translation length. The multithread spiral or cone form of the inner POS electrode displayed a 1.5 times increase of POS impedance. Different types of magnetic mirror arrangement at the POS exit resulted in improved POS characteristics and decreased plasma translation length. The parameters of a coaxial ion diode with axial magnetic field installed after the POS and the characteristics of its high-power ion beam have been studied.

    Original languageEnglish
    Title of host publicationIEEE Int Conf Plasma Sci 1989
    Editors Anon
    Place of PublicationPiscataway, NJ, United States
    PublisherPubl by IEEE
    Pages43
    Number of pages1
    Publication statusPublished - 1989
    EventIEEE International Conference on Plasma Science 1989 - Buffalo, NY, USA
    Duration: 22 May 198924 May 1989

    Other

    OtherIEEE International Conference on Plasma Science 1989
    CityBuffalo, NY, USA
    Period22.5.8924.5.89

    ASJC Scopus subject areas

    • Engineering(all)

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  • Cite this

    Ananjin, P. S., Bystritskii, V. M., Ivanov, I. B., Karpov, V. B., Koval'chuk, B. M., Krasik, Y. E., Lisitsyn, I. V., Paul, E. V., Sinebrjukhov, A. A., & Tolmatcheva, V. G. (1989). Plasma opening switch operation with microsecond generator. In Anon (Ed.), IEEE Int Conf Plasma Sci 1989 (pp. 43). Publ by IEEE.