Abstract
This letter reports on great differences in values of the plasma Up and floating Ufl potentials in sputtering discharges generated by single and dual magnetrons. It is shown that (i) the differences in Up and Ufl result in strongly different properties of films sputtered by single and dual magnetrons at the same power delivered to the magnetron discharge, (ii) in the direct current single and dual magnetron discharges, the values of Up and Ufl strongly depend on the electric conductivity of the surface of the grounded deposition chamber, and (iii) a pulsed dual magnetron with a closed magnetic B field is the only one sputtering system, which enables us to sputter the films with fully reproducible properties.
| Original language | English |
|---|---|
| Article number | 060605 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 35 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1 Nov 2017 |
ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
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Musil, J., & Jaroš, M. (2017). Plasma and floating potentials in magnetron discharges. Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 35(6), [060605]. https://doi.org/10.1116/1.4992054