Abstract
This letter reports on great differences in values of the plasma Up and floating Ufl potentials in sputtering discharges generated by single and dual magnetrons. It is shown that (i) the differences in Up and Ufl result in strongly different properties of films sputtered by single and dual magnetrons at the same power delivered to the magnetron discharge, (ii) in the direct current single and dual magnetron discharges, the values of Up and Ufl strongly depend on the electric conductivity of the surface of the grounded deposition chamber, and (iii) a pulsed dual magnetron with a closed magnetic B field is the only one sputtering system, which enables us to sputter the films with fully reproducible properties.
| Original language | English |
|---|---|
| Article number | 060605 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 35 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1 Nov 2017 |
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ASJC Scopus subject areas
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
Cite this
Plasma and floating potentials in magnetron discharges. / Musil, Jindřich; Jaroš, Martin.
In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 35, No. 6, 060605, 01.11.2017.Research output: Contribution to journal › Article
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TY - JOUR
T1 - Plasma and floating potentials in magnetron discharges
AU - Musil, Jindřich
AU - Jaroš, Martin
PY - 2017/11/1
Y1 - 2017/11/1
N2 - This letter reports on great differences in values of the plasma Up and floating Ufl potentials in sputtering discharges generated by single and dual magnetrons. It is shown that (i) the differences in Up and Ufl result in strongly different properties of films sputtered by single and dual magnetrons at the same power delivered to the magnetron discharge, (ii) in the direct current single and dual magnetron discharges, the values of Up and Ufl strongly depend on the electric conductivity of the surface of the grounded deposition chamber, and (iii) a pulsed dual magnetron with a closed magnetic B field is the only one sputtering system, which enables us to sputter the films with fully reproducible properties.
AB - This letter reports on great differences in values of the plasma Up and floating Ufl potentials in sputtering discharges generated by single and dual magnetrons. It is shown that (i) the differences in Up and Ufl result in strongly different properties of films sputtered by single and dual magnetrons at the same power delivered to the magnetron discharge, (ii) in the direct current single and dual magnetron discharges, the values of Up and Ufl strongly depend on the electric conductivity of the surface of the grounded deposition chamber, and (iii) a pulsed dual magnetron with a closed magnetic B field is the only one sputtering system, which enables us to sputter the films with fully reproducible properties.
UR - http://www.scopus.com/inward/record.url?scp=85029873918&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85029873918&partnerID=8YFLogxK
U2 - 10.1116/1.4992054
DO - 10.1116/1.4992054
M3 - Article
AN - SCOPUS:85029873918
VL - 35
JO - Journal of Vacuum Science and Technology A
JF - Journal of Vacuum Science and Technology A
SN - 0734-2101
IS - 6
M1 - 060605
ER -