Plasma and floating potentials in magnetron discharges

Jindřich Musil, Martin Jaroš

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

This letter reports on great differences in values of the plasma Up and floating Ufl potentials in sputtering discharges generated by single and dual magnetrons. It is shown that (i) the differences in Up and Ufl result in strongly different properties of films sputtered by single and dual magnetrons at the same power delivered to the magnetron discharge, (ii) in the direct current single and dual magnetron discharges, the values of Up and Ufl strongly depend on the electric conductivity of the surface of the grounded deposition chamber, and (iii) a pulsed dual magnetron with a closed magnetic B field is the only one sputtering system, which enables us to sputter the films with fully reproducible properties.

Original languageEnglish
Article number060605
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume35
Issue number6
DOIs
Publication statusPublished - 1 Nov 2017

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Magnetrons
plasma potentials
floating
magnetrons
Sputtering
Plasmas
sputtering
chambers
direct current
conductivity

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

Cite this

Plasma and floating potentials in magnetron discharges. / Musil, Jindřich; Jaroš, Martin.

In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, Vol. 35, No. 6, 060605, 01.11.2017.

Research output: Contribution to journalArticle

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