Physicochemical Study of Ta2O5 and SiO2-Ta2O5 Film Formation from Film-Forming Solutions

R. V. Gryaznov, L. P. Borilo, V. V. Kozik, A. G. Mal'chik

    Research output: Contribution to journal › Article

    4 Citations (Scopus)

    Abstract

    In order to study physicochemical processes of formation of Ta2O5 and SiO2-Ta2O5 films from film-forming solutions, the properties of these solutions, and also the thermal-oxidative breakdown and the properties of the obtained films, were studied.

    Original languageEnglish
    Pages (from-to)18-20
    Number of pages3
    JournalRussian Journal of Applied Chemistry
    Volume74
    Issue number1
    DOIs
    Publication statusPublished - 2001

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    ASJC Scopus subject areas

    • Chemistry (miscellaneous)

    Cite this

    Physicochemical Study of Ta2O5 and SiO2-Ta2O5 Film Formation from Film-Forming Solutions. / Gryaznov, R. V.; Borilo, L. P.; Kozik, V. V.; Mal'chik, A. G.

    In: Russian Journal of Applied Chemistry, Vol. 74, No. 1, 2001, p. 18-20.

    Research output: Contribution to journal › Article

    Gryaznov, RV, Borilo, LP, Kozik, VV & Mal'chik, AG 2001, 'Physicochemical Study of Ta2O5 and SiO2-Ta2O5 Film Formation from Film-Forming Solutions', Russian Journal of Applied Chemistry, vol. 74, no. 1, pp. 18-20. https://doi.org/10.1023/A:1012763009684
    Gryaznov RV, Borilo LP, Kozik VV, Mal'chik AG. Physicochemical Study of Ta2O5 and SiO2-Ta2O5 Film Formation from Film-Forming Solutions. Russian Journal of Applied Chemistry. 2001;74(1):18-20. https://doi.org/10.1023/A:1012763009684
    Gryaznov, R. V. ; Borilo, L. P. ; Kozik, V. V. ; Mal'chik, A. G. / Physicochemical Study of Ta2O5 and SiO2-Ta2O5 Film Formation from Film-Forming Solutions. In: Russian Journal of Applied Chemistry. 2001 ; Vol. 74, No. 1. pp. 18-20.
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