Physicochemical investigation of formation of SiO2 powders and films from film-forming solutions

A. G. Mal'chik, L. P. Borilo, V. V. Kozik

    Research output: Contribution to journal › Article

    4 Citations (Scopus)

    Abstract

    To investigate physicochemical processes of SiO2 formation from film-forming solutions, the properties of these solutions, the processes taking place in a thin layer of such solutions at 298 and 333 K, and thermooxidation destruction at high temperature are studied.

    Original languageEnglish
    Pages (from-to)198-201
    Number of pages4
    JournalRussian Journal of Applied Chemistry
    Volume69
    Issue number2
    Publication statusPublished - Feb 1996

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    Powders
    Thermooxidation
    Temperature

    ASJC Scopus subject areas

    • Chemistry (miscellaneous)

    Cite this

    Physicochemical investigation of formation of SiO2 powders and films from film-forming solutions. / Mal'chik, A. G.; Borilo, L. P.; Kozik, V. V.

    In: Russian Journal of Applied Chemistry, Vol. 69, No. 2, 02.1996, p. 198-201.

    Research output: Contribution to journal › Article

    Mal'chik, AG, Borilo, LP & Kozik, VV 1996, 'Physicochemical investigation of formation of SiO2 powders and films from film-forming solutions', Russian Journal of Applied Chemistry, vol. 69, no. 2, pp. 198-201.
    Mal'chik AG, Borilo LP, Kozik VV. Physicochemical investigation of formation of SiO2 powders and films from film-forming solutions. Russian Journal of Applied Chemistry. 1996 Feb;69(2):198-201.
    Mal'chik, A. G. ; Borilo, L. P. ; Kozik, V. V. / Physicochemical investigation of formation of SiO2 powders and films from film-forming solutions. In: Russian Journal of Applied Chemistry. 1996 ; Vol. 69, No. 2. pp. 198-201.
    @article{bc77e340730e445bb376fdcc3fdc2786,
    title = "Physicochemical investigation of formation of SiO2 powders and films from film-forming solutions",
    abstract = "To investigate physicochemical processes of SiO2 formation from film-forming solutions, the properties of these solutions, the processes taking place in a thin layer of such solutions at 298 and 333 K, and thermooxidation destruction at high temperature are studied.",
    author = "Mal'chik, {A. G.} and Borilo, {L. P.} and Kozik, {V. V.}",
    year = "1996",
    month = "2",
    language = "English",
    volume = "69",
    pages = "198--201",
    journal = "Russian Journal of Applied Chemistry",
    issn = "1070-4272",
    publisher = "Maik Nauka-Interperiodica Publishing",
    number = "2",

    }

    TY - JOUR

    T1 - Physicochemical investigation of formation of SiO2 powders and films from film-forming solutions

    AU - Mal'chik, A. G.

    AU - Borilo, L. P.

    AU - Kozik, V. V.

    PY - 1996/2

    Y1 - 1996/2

    N2 - To investigate physicochemical processes of SiO2 formation from film-forming solutions, the properties of these solutions, the processes taking place in a thin layer of such solutions at 298 and 333 K, and thermooxidation destruction at high temperature are studied.

    AB - To investigate physicochemical processes of SiO2 formation from film-forming solutions, the properties of these solutions, the processes taking place in a thin layer of such solutions at 298 and 333 K, and thermooxidation destruction at high temperature are studied.

    UR - http://www.scopus.com/inward/record.url?scp=27544515490&partnerID=8YFLogxK

    UR - http://www.scopus.com/inward/citedby.url?scp=27544515490&partnerID=8YFLogxK

    M3 - Article

    VL - 69

    SP - 198

    EP - 201

    JO - Russian Journal of Applied Chemistry

    JF - Russian Journal of Applied Chemistry

    SN - 1070-4272

    IS - 2

    ER -

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