Abstract
To investigate physicochemical processes of SiO2 formation from film-forming solutions, the properties of these solutions, the processes taking place in a thin layer of such solutions at 298 and 333 K, and thermooxidation destruction at high temperature are studied.
| Original language | English |
|---|---|
| Pages (from-to) | 198-201 |
| Number of pages | 4 |
| Journal | Russian Journal of Applied Chemistry |
| Volume | 69 |
| Issue number | 2 |
| Publication status | Published - Feb 1996 |
ASJC Scopus subject areas
- Chemistry (miscellaneous)
Fingerprint Dive into the research topics of 'Physicochemical investigation of formation of SiO<sub>2</sub> powders and films from film-forming solutions'. Together they form a unique fingerprint.
Cite this
Mal'chik, A. G., Borilo, L. P., & Kozik, V. V. (1996). Physicochemical investigation of formation of SiO2 powders and films from film-forming solutions. Russian Journal of Applied Chemistry, 69(2), 198-201.