Physical and mechanical properties of sputtered Ta-Si-N films with a high (≥40 at%) content of Si

H. Zeman, J. Musil, P. Zeman

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31 Citations (Scopus)

Abstract

The ternary Ta-Si-N films produced by magnetron sputtering using an alloyed TaSi2 were discussed. The effect of partial pressure of nitrogen on mechanical properties of the films was analyzed under specific conditions. It was stated that the films exhibited an X-ray amorphous structure, with increasing electric resistivity with increasing Si3N4 content. It was observed that the films achieved a high value of harness which was considerably higher than that of bulk Si3N4.

Original languageEnglish
Pages (from-to)646-649
Number of pages4
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume22
Issue number3
DOIs
Publication statusPublished - 1 May 2004

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ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films

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