Photoactivated properties of TiO<sub>2</sub> films prepared by magnetron sputtering

Abstract

This article reports on photoactivity of sputtered TiO₂ films induced by UV irradiation. TiO₂ films were prepared by dc pulsed reactive magnetron sputtering using a dual magnetron operated in bipolar mode and equipped with Ti targets. The photoactivity of TiO₂ films, characterized by the water droplet contact angle (WDCA) on the film surface after UV irradiation, was evaluated and discussed in detail. The structure of TiO₂ film was measured using X-ray diffraction and surface morphology using AFM. A sharp decrease in WDCA to ∼10° has been observed for optimal sputtering conditions. Possibility of low-temperature sputtering (<90°) of photoactive TiO₂ films on heat sensitive substrates has been introduced.

Original language	English
Journal	Plasma Processes and Polymers
Volume	4
Issue number	SUPPL.1
DOIs	https://doi.org/10.1002/ppap.200731303
Publication status	Published - 1 Dec 2007

Keywords

Films
Low temperature sputtering
Nanocrystalline films
Pulsed discharges
Structure
TiO thin films
Wettability

ASJC Scopus subject areas

Condensed Matter Physics
Polymers and Plastics

Access to Document

10.1002/ppap.200731303

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Heřman, D., Šícha, J., & Musil, J. (2007). Photoactivated properties of TiO₂ films prepared by magnetron sputtering. Plasma Processes and Polymers, 4(SUPPL.1). https://doi.org/10.1002/ppap.200731303

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abstract = "This article reports on photoactivity of sputtered TiO2 films induced by UV irradiation. TiO2 films were prepared by dc pulsed reactive magnetron sputtering using a dual magnetron operated in bipolar mode and equipped with Ti targets. The photoactivity of TiO2 films, characterized by the water droplet contact angle (WDCA) on the film surface after UV irradiation, was evaluated and discussed in detail. The structure of TiO2 film was measured using X-ray diffraction and surface morphology using AFM. A sharp decrease in WDCA to ∼10° has been observed for optimal sputtering conditions. Possibility of low-temperature sputtering (<90°) of photoactive TiO2 films on heat sensitive substrates has been introduced.",

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AU - Musil, Jindřich

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AB - This article reports on photoactivity of sputtered TiO2 films induced by UV irradiation. TiO2 films were prepared by dc pulsed reactive magnetron sputtering using a dual magnetron operated in bipolar mode and equipped with Ti targets. The photoactivity of TiO2 films, characterized by the water droplet contact angle (WDCA) on the film surface after UV irradiation, was evaluated and discussed in detail. The structure of TiO2 film was measured using X-ray diffraction and surface morphology using AFM. A sharp decrease in WDCA to ∼10° has been observed for optimal sputtering conditions. Possibility of low-temperature sputtering (<90°) of photoactive TiO2 films on heat sensitive substrates has been introduced.

KW - Films

KW - Low temperature sputtering

KW - Nanocrystalline films

KW - Pulsed discharges

KW - Structure

KW - TiO thin films

KW - Wettability

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