Photoactivated properties of TiO2 films prepared by magnetron sputtering

David Heřman, Jan Šícha, Jindřich Musil

Research output: Contribution to journalArticle

5 Citations (Scopus)

Abstract

This article reports on photoactivity of sputtered TiO2 films induced by UV irradiation. TiO2 films were prepared by dc pulsed reactive magnetron sputtering using a dual magnetron operated in bipolar mode and equipped with Ti targets. The photoactivity of TiO2 films, characterized by the water droplet contact angle (WDCA) on the film surface after UV irradiation, was evaluated and discussed in detail. The structure of TiO2 film was measured using X-ray diffraction and surface morphology using AFM. A sharp decrease in WDCA to ∼10° has been observed for optimal sputtering conditions. Possibility of low-temperature sputtering (<90°) of photoactive TiO2 films on heat sensitive substrates has been introduced.

Original languageEnglish
JournalPlasma Processes and Polymers
Volume4
Issue numberSUPPL.1
DOIs
Publication statusPublished - 1 Dec 2007

Fingerprint

Magnetron sputtering
magnetron sputtering
Contact angle
Sputtering
sputtering
Irradiation
irradiation
Water
Reactive sputtering
water
Surface morphology
atomic force microscopy
X ray diffraction
heat
Substrates
diffraction
x rays
Temperature

Keywords

  • Films
  • Low temperature sputtering
  • Nanocrystalline films
  • Pulsed discharges
  • Structure
  • TiO thin films
  • Wettability

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Polymers and Plastics

Cite this

Photoactivated properties of TiO2 films prepared by magnetron sputtering. / Heřman, David; Šícha, Jan; Musil, Jindřich.

In: Plasma Processes and Polymers, Vol. 4, No. SUPPL.1, 01.12.2007.

Research output: Contribution to journalArticle

@article{f1cce0a5b26a4adaa88c1d9c49152776,
title = "Photoactivated properties of TiO2 films prepared by magnetron sputtering",
abstract = "This article reports on photoactivity of sputtered TiO2 films induced by UV irradiation. TiO2 films were prepared by dc pulsed reactive magnetron sputtering using a dual magnetron operated in bipolar mode and equipped with Ti targets. The photoactivity of TiO2 films, characterized by the water droplet contact angle (WDCA) on the film surface after UV irradiation, was evaluated and discussed in detail. The structure of TiO2 film was measured using X-ray diffraction and surface morphology using AFM. A sharp decrease in WDCA to ∼10° has been observed for optimal sputtering conditions. Possibility of low-temperature sputtering (<90°) of photoactive TiO2 films on heat sensitive substrates has been introduced.",
keywords = "Films, Low temperature sputtering, Nanocrystalline films, Pulsed discharges, Structure, TiO thin films, Wettability",
author = "David Heřman and Jan Š{\'i}cha and Jindřich Musil",
year = "2007",
month = "12",
day = "1",
doi = "10.1002/ppap.200731303",
language = "English",
volume = "4",
journal = "Plasma Processes and Polymers",
issn = "1612-8850",
publisher = "Wiley-VCH Verlag",
number = "SUPPL.1",

}

TY - JOUR

T1 - Photoactivated properties of TiO2 films prepared by magnetron sputtering

AU - Heřman, David

AU - Šícha, Jan

AU - Musil, Jindřich

PY - 2007/12/1

Y1 - 2007/12/1

N2 - This article reports on photoactivity of sputtered TiO2 films induced by UV irradiation. TiO2 films were prepared by dc pulsed reactive magnetron sputtering using a dual magnetron operated in bipolar mode and equipped with Ti targets. The photoactivity of TiO2 films, characterized by the water droplet contact angle (WDCA) on the film surface after UV irradiation, was evaluated and discussed in detail. The structure of TiO2 film was measured using X-ray diffraction and surface morphology using AFM. A sharp decrease in WDCA to ∼10° has been observed for optimal sputtering conditions. Possibility of low-temperature sputtering (<90°) of photoactive TiO2 films on heat sensitive substrates has been introduced.

AB - This article reports on photoactivity of sputtered TiO2 films induced by UV irradiation. TiO2 films were prepared by dc pulsed reactive magnetron sputtering using a dual magnetron operated in bipolar mode and equipped with Ti targets. The photoactivity of TiO2 films, characterized by the water droplet contact angle (WDCA) on the film surface after UV irradiation, was evaluated and discussed in detail. The structure of TiO2 film was measured using X-ray diffraction and surface morphology using AFM. A sharp decrease in WDCA to ∼10° has been observed for optimal sputtering conditions. Possibility of low-temperature sputtering (<90°) of photoactive TiO2 films on heat sensitive substrates has been introduced.

KW - Films

KW - Low temperature sputtering

KW - Nanocrystalline films

KW - Pulsed discharges

KW - Structure

KW - TiO thin films

KW - Wettability

UR - http://www.scopus.com/inward/record.url?scp=70349423599&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=70349423599&partnerID=8YFLogxK

U2 - 10.1002/ppap.200731303

DO - 10.1002/ppap.200731303

M3 - Article

VL - 4

JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

SN - 1612-8850

IS - SUPPL.1

ER -