Abstract
This article reports on photoactivity of sputtered TiO2 films induced by UV irradiation. TiO2 films were prepared by dc pulsed reactive magnetron sputtering using a dual magnetron operated in bipolar mode and equipped with Ti targets. The photoactivity of TiO2 films, characterized by the water droplet contact angle (WDCA) on the film surface after UV irradiation, was evaluated and discussed in detail. The structure of TiO2 film was measured using X-ray diffraction and surface morphology using AFM. A sharp decrease in WDCA to ∼10° has been observed for optimal sputtering conditions. Possibility of low-temperature sputtering (<90°) of photoactive TiO2 films on heat sensitive substrates has been introduced.
| Original language | English |
|---|---|
| Journal | Plasma Processes and Polymers |
| Volume | 4 |
| Issue number | SUPPL.1 |
| DOIs | |
| Publication status | Published - 1 Dec 2007 |
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Keywords
- Films
- Low temperature sputtering
- Nanocrystalline films
- Pulsed discharges
- Structure
- TiO thin films
- Wettability
ASJC Scopus subject areas
- Condensed Matter Physics
- Polymers and Plastics
Cite this
Photoactivated properties of TiO2 films prepared by magnetron sputtering. / Heřman, David; Šícha, Jan; Musil, Jindřich.
In: Plasma Processes and Polymers, Vol. 4, No. SUPPL.1, 01.12.2007.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Photoactivated properties of TiO2 films prepared by magnetron sputtering
AU - Heřman, David
AU - Šícha, Jan
AU - Musil, Jindřich
PY - 2007/12/1
Y1 - 2007/12/1
N2 - This article reports on photoactivity of sputtered TiO2 films induced by UV irradiation. TiO2 films were prepared by dc pulsed reactive magnetron sputtering using a dual magnetron operated in bipolar mode and equipped with Ti targets. The photoactivity of TiO2 films, characterized by the water droplet contact angle (WDCA) on the film surface after UV irradiation, was evaluated and discussed in detail. The structure of TiO2 film was measured using X-ray diffraction and surface morphology using AFM. A sharp decrease in WDCA to ∼10° has been observed for optimal sputtering conditions. Possibility of low-temperature sputtering (<90°) of photoactive TiO2 films on heat sensitive substrates has been introduced.
AB - This article reports on photoactivity of sputtered TiO2 films induced by UV irradiation. TiO2 films were prepared by dc pulsed reactive magnetron sputtering using a dual magnetron operated in bipolar mode and equipped with Ti targets. The photoactivity of TiO2 films, characterized by the water droplet contact angle (WDCA) on the film surface after UV irradiation, was evaluated and discussed in detail. The structure of TiO2 film was measured using X-ray diffraction and surface morphology using AFM. A sharp decrease in WDCA to ∼10° has been observed for optimal sputtering conditions. Possibility of low-temperature sputtering (<90°) of photoactive TiO2 films on heat sensitive substrates has been introduced.
KW - Films
KW - Low temperature sputtering
KW - Nanocrystalline films
KW - Pulsed discharges
KW - Structure
KW - TiO thin films
KW - Wettability
UR - http://www.scopus.com/inward/record.url?scp=70349423599&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=70349423599&partnerID=8YFLogxK
U2 - 10.1002/ppap.200731303
DO - 10.1002/ppap.200731303
M3 - Article
VL - 4
JO - Plasma Processes and Polymers
JF - Plasma Processes and Polymers
SN - 1612-8850
IS - SUPPL.1
ER -