PECVD synthesis, optical and mechanical properties of silicon carbonnitride films

Evgeniya Ermakova, Yurii Rumyantsev, Artur Shugurov, Alexey Panin, Marina Kosinova

Research output: Contribution to journalArticle

23 Citations (Scopus)

Abstract

SiCxNy thin films were synthesized at a temperature of 700 C by the PECVD process, using trimethylphenylsilane C6H5Si(CH3)3 (TMPhS) and ammonia as a reactive mixture. The effect of NH3 dilution on the structure and chemical bonding of SiCxNy films was investigated by Fourier transform infrared spectroscopy. X-ray photoelectron spectroscopy. Raman spectroscopy, high-resolution transmission electron microscopy and energy-dispersive X-ray analysis. The influence of deposition conditions on the transmittance. the optical band gap. the hardness and the Young's modulus of SiCxNy films was studied. It was shown that the chemical composition and the functional properties of the films are governed by the initial pressure ratio of NH3 to TMPhS. The variation of the ratio enables the film of different composition to be deposited, e.g. Sicx. SiCxNy and SiNy. It was shown that the films deposited from a reactive mixture with the highest ammonia dilution had a transmittance comparable to that of SiO2 and hardness of 23GPa.

Original languageEnglish
Pages (from-to)102-108
Number of pages7
JournalApplied Surface Science
Volume339
Issue number1
DOIs
Publication statusPublished - 2015

Keywords

  • Hardness
  • Optical band gap
  • PECVD
  • SiCN films
  • Young's modulus

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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