Oxidation of sputtered Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O films during thermal annealing in flowing air

Jindřich Musil, Petr Zeman, Michal Jirout, Martin Šašek, Radomir Čerstvý

Research output: Contribution to journalArticle

6 Citations (Scopus)

Abstract

The article deals with oxidation of Cu, Zr, ZrCu, ZrO2, and Zr-Cu-O films during post-deposition thermal annealing in flowing air. The films were deposited using dc unbalanced magnetron from pure or composed target in Ar or an Ar + O2 mixture. The oxidation behavior of the films was characterized by high-temperature thermogravimetry and XRD. Mechanical properties were measured by a microindenter Fischerscope H100. Thermal annealing was carried out over a wide range from 300 to 1 300 °C. Special attention was devoted to the oxidation of Cu and to the effect of Cu content in Zr-Cu-O films on the oxidation resistance. It was shown that the conversion CuO ↔ Cu2O at ∼1040 °C is a reversible process.

Original languageEnglish
JournalPlasma Processes and Polymers
Volume4
Issue numberSUPPL.1
DOIs
Publication statusPublished - 1 Dec 2007

Keywords

  • Films
  • Magnetron sputtering
  • Oxidation resistance
  • Thermogravimetry
  • Zr-Cu-O films
  • ZrO films

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Polymers and Plastics

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