Optical emission spectra and ion energy distribution functions in TiN deposition process by reactive pulsed magnetron sputtering

Yong M. Kim, Yun M. Chung, Min J. Jung, J. Vlček, J. Musil, Jeon G. Han

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

In this study, a pulsed magnetron sputtering was employed to synthesize TiN films. We deal with pulse parameters such as pulse frequency and duty cycle in argon - Nitrogen plasmas. Also, optical emission spectroscopy and energy resolved mass spectrometry as an integrated plasma diagnostics was employed during synthesis of thin films. The major emission lines and time-averaged ion energy distribution functions (IEDFs) corresponding to various titanium and gas discharge species are in situ surveyed in terms of frequency and duty cycles during deposition. The corresponding surface morphology was analyzed by atomic force microscopy (AFM).

Original languageEnglish
Pages (from-to)835-840
Number of pages6
JournalSurface and Coatings Technology
Volume200
Issue number1-4 SPEC. ISS.
DOIs
Publication statusPublished - 1 Oct 2005

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Keywords

  • Ion energy distribution function (IEDF)
  • Magnetron sputtering
  • OES
  • Pulsed plasma
  • TiN deposition

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

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