Optical emission and mass spectroscopy of plasma processes in reactive DC pulsed magnetron sputtering of aluminium oxide

M. Novotný, J. Bulír, P. Pokorný, J. Bocan, P. Fitl, J. Lancok, J. Musil

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

Optical emission spectroscopy (OES) and mass spectrometry were used for plasma investigation of DC pulsed reactive magnetron sputtering of aluminium oxide. Aluminium target was sputtered in a reactive oxygen/argon atmosphere. Special attention was paid to the transition from the dielectric to metallic mode. Mass spectra were recorded at the substrate. OES spectra were taken at the target and at the substrate. Both mass and emission spectra obtained in the transition mode revealed distinct changes in plasma composition (O, O 2, Al and AlO plasma species and corresponding positive ions). The transition from the dielectric to metallic mode is followed by a decrease of atomic oxygen intensity, while the intensity of aluminium species increases. AlO molecule appeared in the mass spectra only.

Original languageEnglish
Pages (from-to)697-700
Number of pages4
JournalJournal of Optoelectronics and Advanced Materials
Volume12
Issue number3
Publication statusPublished - 1 Mar 2010

Fingerprint

Aluminum Oxide
optical emission spectroscopy
Magnetron sputtering
mass spectra
magnetron sputtering
Optical emission spectroscopy
mass spectroscopy
aluminum oxides
direct current
Spectroscopy
Aluminum
Plasmas
Oxides
argon-oxygen atmospheres
Oxygen
aluminum
plasma composition
Argon
Reactive sputtering
Substrates

Keywords

  • Alumina
  • Mass spectroscopy
  • Optical emission spectroscopy
  • Plasma spectroscopy
  • Reactive magnetron sputtering

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Optical emission and mass spectroscopy of plasma processes in reactive DC pulsed magnetron sputtering of aluminium oxide. / Novotný, M.; Bulír, J.; Pokorný, P.; Bocan, J.; Fitl, P.; Lancok, J.; Musil, J.

In: Journal of Optoelectronics and Advanced Materials, Vol. 12, No. 3, 01.03.2010, p. 697-700.

Research output: Contribution to journalArticle

Novotný, M. ; Bulír, J. ; Pokorný, P. ; Bocan, J. ; Fitl, P. ; Lancok, J. ; Musil, J. / Optical emission and mass spectroscopy of plasma processes in reactive DC pulsed magnetron sputtering of aluminium oxide. In: Journal of Optoelectronics and Advanced Materials. 2010 ; Vol. 12, No. 3. pp. 697-700.
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