Abstract
Tin sulfide thin films were prepared by DC magnetron sputtering of a nanostructured SnS target in argon. The obtained samples were analyzed using atomic force microscopy (AFM), radio frequency glow discharge optical emission spectroscopy (RF-GD-OES) and UV-vis spectrophotometry. The thickness, roughness and surface porosity were evaluated using module software for AFM data visualization and analysis Gwyddion. A thin film growth mechanism was suggested based on the analysis of the AFM images.
Original language | English |
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Pages (from-to) | 483-487 |
Number of pages | 5 |
Journal | Chalcogenide Letters |
Volume | 12 |
Issue number | 9 |
Publication status | Published - 2015 |
Keywords
- Atomic force microscopy
- Magnetron sputtering
- SnS thin films
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Chemistry(all)
- Physics and Astronomy(all)