Operation parameters of magnetron diode for high-rate deposition of aluminum films

Abstract

This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode.

Original language	English
Article number	032020
Journal	Journal of Physics: Conference Series
Volume	1115
Issue number	3
DOIs	https://doi.org/10.1088/1742-6596/1115/3/032020
Publication status	Published - 27 Nov 2018
Event	6th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018 - Tomsk, Russian Federation Duration: 16 Sep 2018 → 22 Sep 2018

ASJC Scopus subject areas

Physics and Astronomy(all)

Access to Document

10.1088/1742-6596/1115/3/032020

Fingerprint Dive into the research topics of 'Operation parameters of magnetron diode for high-rate deposition of aluminum films'. Together they form a unique fingerprint.

Cite this

Sidelev, D. V., & Grudinin, V. A. (2018). Operation parameters of magnetron diode for high-rate deposition of aluminum films. Journal of Physics: Conference Series, 1115(3), [032020]. https://doi.org/10.1088/1742-6596/1115/3/032020

@article{684734d39fa54df691e23a40640f1f61,

title = "Operation parameters of magnetron diode for high-rate deposition of aluminum films",

abstract = "This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode.",

author = "Sidelev, {D. V.} and Grudinin, {V. A.}",

year = "2018",

month = nov,

day = "27",

doi = "10.1088/1742-6596/1115/3/032020",

language = "English",

volume = "1115",

journal = "Journal of Physics: Conference Series",

issn = "1742-6588",

publisher = "IOP Publishing Ltd.",

number = "3",

note = "6th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018 ; Conference date: 16-09-2018 Through 22-09-2018",

}

TY - JOUR

T1 - Operation parameters of magnetron diode for high-rate deposition of aluminum films

AU - Sidelev, D. V.

AU - Grudinin, V. A.

PY - 2018/11/27

Y1 - 2018/11/27

N2 - This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode.

AB - This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode.

UR - http://www.scopus.com/inward/record.url?scp=85058242282&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85058242282&partnerID=8YFLogxK

U2 - 10.1088/1742-6596/1115/3/032020

DO - 10.1088/1742-6596/1115/3/032020

M3 - Conference article

AN - SCOPUS:85058242282

VL - 1115

JO - Journal of Physics: Conference Series

JF - Journal of Physics: Conference Series

SN - 1742-6588

IS - 3

M1 - 032020

T2 - 6th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018

Y2 - 16 September 2018 through 22 September 2018

ER -