This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode.
|Journal||Journal of Physics: Conference Series|
|Publication status||Published - 27 Nov 2018|
|Event||6th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018 - Tomsk, Russian Federation|
Duration: 16 Sep 2018 → 22 Sep 2018
ASJC Scopus subject areas
- Physics and Astronomy(all)