Operation parameters of magnetron diode for high-rate deposition of aluminum films

Research output: Contribution to journalConference article

Abstract

This article reports on the results of the detailed study of erosion of Al target in magnetron discharge plasma. It was demonstrated that the combination of middle-frequency (MF) and high impulse power (HiPIMS) power supply results in the significant increase of deposition rates of Al films by changing of sputtering yield. The MF pulse assists HiPIMS discharge to transit in a high power mode.

Original languageEnglish
Article number032020
JournalJournal of Physics: Conference Series
Volume1115
Issue number3
DOIs
Publication statusPublished - 27 Nov 2018
Event6th International Congress on Energy Fluxes and Radiation Effects 2018, EFRE 2018 - Tomsk, Russian Federation
Duration: 16 Sep 201822 Sep 2018

    Fingerprint

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this