Abstract
A method of increasing the emissive part of the area of metal-dielectric-metal (MDM) cathodes by forming microscopic protuberances on one of the electrodes by the photolithographic technique is presented. The manufacturing technology for Al-SiO2-Al thin-film structure with microprotuberances of the size of ∼1 μm is described. A mechanism for increasing the emission current is proposed.
Original language | English |
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Pages (from-to) | 346-347 |
Number of pages | 2 |
Journal | Journal of Communications Technology and Electronics |
Volume | 42 |
Issue number | 3 |
Publication status | Published - 1997 |
ASJC Scopus subject areas
- Computer Networks and Communications
- Electrical and Electronic Engineering