A method of increasing the emissive part of the area of metal-dielectric-metal (MDM) cathodes by forming microscopic protuberances on one of the electrodes by the photolithographic technique is presented. The manufacturing technology for Al-SiO2-Al thin-film structure with microprotuberances of the size of ∼1 μm is described. A mechanism for increasing the emission current is proposed.
|Number of pages||2|
|Journal||Journal of Communications Technology and Electronics|
|Publication status||Published - 1997|
ASJC Scopus subject areas
- Computer Networks and Communications
- Electrical and Electronic Engineering