On high dose nitrogen implantation of PVD titanium nitride

Yurii P. Sharkeev, Steve J. Bull, Anthony J. Perry, Melissa L. Klingenberg, Sergei V. Fortuna, Markus Michler, Rafael R. Manory, Ivan A. Shulepov

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21 Citations (Scopus)

Abstract

A 3 × 3 matrix of samples has been ion implanted with nitrogen at low-to-high doses and low-to-high current densities (dose rates). All samples show surface exfoliation which results in a loss of the implanted nitrogen and a consequent loss of the wear-resistant properties-a condition of over-implantation reminiscent of that observed with metal ion implantation. There is an uptake of post-implantation oxygen which is believed to form an amorphous TiO2 component in the surface leading to the well-established low frictional properties. This uptake decreases as the dose rate is increased and would lead to a loss of wear resistant properties. The work confirms that a dose of 3 × 1017 ions cm- 2 is optimal provided that the dose rate does not exceed the present industrial standard.

Original languageEnglish
Pages (from-to)5915-5920
Number of pages6
JournalSurface and Coatings Technology
Volume200
Issue number20-21
DOIs
Publication statusPublished - 22 May 2006

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Keywords

  • Ion implantation
  • Nitrogen ions
  • Surface treatment
  • Titanium nitride

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Sharkeev, Y. P., Bull, S. J., Perry, A. J., Klingenberg, M. L., Fortuna, S. V., Michler, M., Manory, R. R., & Shulepov, I. A. (2006). On high dose nitrogen implantation of PVD titanium nitride. Surface and Coatings Technology, 200(20-21), 5915-5920. https://doi.org/10.1016/j.surfcoat.2005.09.010