Obtaining Silicon Oxide Nanoparticles Doped with Fluorine and Gold Particles by the Pulsed Plasma-Chemical Method

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Abstract

This paper presents a study on pulsed plasma-chemical synthesis of fluorine- and gold-doped silicon oxide nanopowder. The gold- and fluorine-containing precursors were gold chloride (AuCl 3 ) and sulphur hexafluoride (SF 6 ). Pulsed plasma-chemical synthesis is realized on the laboratory stand, including a plasma-chemical reactor and TEA-500 electron accelerator. The parameters of the electron beam are as follows: 400-450 keV electron energy, 60 ns half-amplitude pulse duration, up to 200 J pulse energy, and 5 cm beam diameter. We confirmed the composite structure of Si x O y @Au by using transmission electron microscopy and energy-dispersive spectroscopy. We determined the chemical composition and morphology of synthesized Si x O y @Au and Si x O y @F nanocomposites. The material contained a Si x O y @Au carrier with an average size of 50-150 nm and a shell of fine particles with an average size of 5-10 nm.

Original languageEnglish
Article number7062687
JournalJournal of Nanotechnology
Volume2019
DOIs
Publication statusPublished - 1 Jan 2019

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ASJC Scopus subject areas

  • Materials Science(all)

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