Observation of bright monochromatic x rays generated by relativistic electrons passing through a multilayer mirror

Abstract

We have observed the emission of 15 keV x rays produced by 500 MeV electrons passing through a x-ray multilayer mirror. The mirror consisted of 300 pairs of W and B₄C layers with layer spacing of 12.36 Å and supported by a 100 μm Si substrate. The x rays were emitted at the Bragg angle θ_γ = 33.15 mrad with respect to the mirror surface and at the angle γ_D = 66.3 mrad with respect to the electron-beam direction. The spatial distribution and the spectral angular dependence of the x rays were measured and shown to be larger than the parametric x rays emitted from the Si substrate. The value of the differential photon efficiency was estimated to be about 0.22 photons/electron/str.

Original language	English
Pages (from-to)	3647-3649
Number of pages	3
Journal	Applied Physics Letters
Volume	76
Issue number	24
Publication status	Published - 12 Jun 2000

ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

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@article{e58d25d9dea44d249719c7e6818d317b,

title = "Observation of bright monochromatic x rays generated by relativistic electrons passing through a multilayer mirror",

abstract = "We have observed the emission of 15 keV x rays produced by 500 MeV electrons passing through a x-ray multilayer mirror. The mirror consisted of 300 pairs of W and B4C layers with layer spacing of 12.36 {\AA} and supported by a 100 μm Si substrate. The x rays were emitted at the Bragg angle θγ = 33.15 mrad with respect to the mirror surface and at the angle γD = 66.3 mrad with respect to the electron-beam direction. The spatial distribution and the spectral angular dependence of the x rays were measured and shown to be larger than the parametric x rays emitted from the Si substrate. The value of the differential photon efficiency was estimated to be about 0.22 photons/electron/str.",

author = "Kaplin, {V. V.} and Uglov, {S. R.} and Zabaev, {V. N.} and Piestrup, {M. A.} and Gary, {C. K.} and Nasonov, {N. N.} and Fuller, {M. K.}",

year = "2000",

month = jun,

day = "12",

language = "English",

volume = "76",

pages = "3647--3649",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

number = "24",

}

TY - JOUR

T1 - Observation of bright monochromatic x rays generated by relativistic electrons passing through a multilayer mirror

AU - Kaplin, V. V.

AU - Uglov, S. R.

AU - Zabaev, V. N.

AU - Piestrup, M. A.

AU - Gary, C. K.

AU - Nasonov, N. N.

AU - Fuller, M. K.

PY - 2000/6/12

Y1 - 2000/6/12

N2 - We have observed the emission of 15 keV x rays produced by 500 MeV electrons passing through a x-ray multilayer mirror. The mirror consisted of 300 pairs of W and B4C layers with layer spacing of 12.36 Å and supported by a 100 μm Si substrate. The x rays were emitted at the Bragg angle θγ = 33.15 mrad with respect to the mirror surface and at the angle γD = 66.3 mrad with respect to the electron-beam direction. The spatial distribution and the spectral angular dependence of the x rays were measured and shown to be larger than the parametric x rays emitted from the Si substrate. The value of the differential photon efficiency was estimated to be about 0.22 photons/electron/str.

AB - We have observed the emission of 15 keV x rays produced by 500 MeV electrons passing through a x-ray multilayer mirror. The mirror consisted of 300 pairs of W and B4C layers with layer spacing of 12.36 Å and supported by a 100 μm Si substrate. The x rays were emitted at the Bragg angle θγ = 33.15 mrad with respect to the mirror surface and at the angle γD = 66.3 mrad with respect to the electron-beam direction. The spatial distribution and the spectral angular dependence of the x rays were measured and shown to be larger than the parametric x rays emitted from the Si substrate. The value of the differential photon efficiency was estimated to be about 0.22 photons/electron/str.

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M3 - Article

AN - SCOPUS:0000434223

VL - 76

SP - 3647

EP - 3649

JO - Applied Physics Letters

JF - Applied Physics Letters

SN - 0003-6951

IS - 24

ER -