Numerical simulation and experimental measurement of pulse generation in coaxial forming lines

I. V. Pegel, L. D. Moreland, A. M. Roitman, E. Schamiloglu, V. P. Gubanov, A. V. Gunin, S. D. Korovin, V. V. Rostov, V. P. Tarakanov

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In the SINUS family of pulsed, high current electron beam accelerators [1], the energy stored within a coaxial forming line (usually oil-insulated) is delivered to a load by means of a high voltage pressurized spark gap switch. For better matching to the load, a transmission line having a nonuniform wave impedance may be included between the switch and the load. Numerical simulation of the system described above has been performed with the use of 2.5D version of 2.5 & 3D, fully electromagnetic PIC-code KARAT [2]. Geometrical parameters of several SINUS accelerators were used. Actual spatial configurations of the gas switch were considered, but the time dependent spark resistance between the electrodes was included as a variable. The obtained results are compared with actual pulse shapes from experiments. Conclusions are drawn about how the spark resistance as the function of time effects the pulse observed.

Original languageEnglish
Title of host publicationIEEE International Conference on Plasma Science
PublisherIEEE
Pages197-198
Number of pages2
Publication statusPublished - 1994
Externally publishedYes
EventProceedings of the IEEE International Conference on Plasma Science - Santa Fe, NM, USA
Duration: 6 Jun 19948 Jun 1994

Other

OtherProceedings of the IEEE International Conference on Plasma Science
CitySanta Fe, NM, USA
Period6.6.948.6.94

ASJC Scopus subject areas

  • Condensed Matter Physics

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  • Cite this

    Pegel, I. V., Moreland, L. D., Roitman, A. M., Schamiloglu, E., Gubanov, V. P., Gunin, A. V., Korovin, S. D., Rostov, V. V., & Tarakanov, V. P. (1994). Numerical simulation and experimental measurement of pulse generation in coaxial forming lines. In IEEE International Conference on Plasma Science (pp. 197-198). IEEE.