Nitriding of VT1-0 titanium in low-pressure non-self-maintained glow discharge with the use of different gas mixtures

Yu Kh Akhmadeev, Yu F. Ivanov, N. N. Koval', I. V. Lopatin, P. M. Shchanin

Research Center for Physical Materials Science and Composite Materials

Research output: Contribution to journal › Article › peer-review

Abstract

The results of nitriding of VT1-0 titanium in the plasma of non-self-maintained glow discharge with a hollow cathode are presented. A nitriding process has been implemented in different gas mixtures at low pressure and temperatures less than 650°C. It is shown that two-hour nitriding in a helium-nitrogen mixture leads to formation of a nitrided layer on the specimen's surface. The obtained layer hardness of 14.5 GPa exceeds the hardness corresponding to pure nitrogen and argon-nitrogen nitriding by a factor of 2 and 1.5, respectively.

Original language	English
Pages (from-to)	166-170
Number of pages	5
Journal	Journal of Surface Investigation
Volume	2
Issue number	1
DOIs	https://doi.org/10.1007/s11700-008-1026-9
Publication status	Published - 1 Feb 2008

ASJC Scopus subject areas

Surfaces, Coatings and Films

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10.1007/s11700-008-1026-9

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abstract = "The results of nitriding of VT1-0 titanium in the plasma of non-self-maintained glow discharge with a hollow cathode are presented. A nitriding process has been implemented in different gas mixtures at low pressure and temperatures less than 650°C. It is shown that two-hour nitriding in a helium-nitrogen mixture leads to formation of a nitrided layer on the specimen's surface. The obtained layer hardness of 14.5 GPa exceeds the hardness corresponding to pure nitrogen and argon-nitrogen nitriding by a factor of 2 and 1.5, respectively.",

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T1 - Nitriding of VT1-0 titanium in low-pressure non-self-maintained glow discharge with the use of different gas mixtures

AU - Akhmadeev, Yu Kh

AU - Ivanov, Yu F.

AU - Koval', N. N.

AU - Lopatin, I. V.

AU - Shchanin, P. M.

PY - 2008/2/1

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N2 - The results of nitriding of VT1-0 titanium in the plasma of non-self-maintained glow discharge with a hollow cathode are presented. A nitriding process has been implemented in different gas mixtures at low pressure and temperatures less than 650°C. It is shown that two-hour nitriding in a helium-nitrogen mixture leads to formation of a nitrided layer on the specimen's surface. The obtained layer hardness of 14.5 GPa exceeds the hardness corresponding to pure nitrogen and argon-nitrogen nitriding by a factor of 2 and 1.5, respectively.

AB - The results of nitriding of VT1-0 titanium in the plasma of non-self-maintained glow discharge with a hollow cathode are presented. A nitriding process has been implemented in different gas mixtures at low pressure and temperatures less than 650°C. It is shown that two-hour nitriding in a helium-nitrogen mixture leads to formation of a nitrided layer on the specimen's surface. The obtained layer hardness of 14.5 GPa exceeds the hardness corresponding to pure nitrogen and argon-nitrogen nitriding by a factor of 2 and 1.5, respectively.

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Nitriding of VT1-0 titanium in low-pressure non-self-maintained glow discharge with the use of different gas mixtures

Abstract

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