Abstract
The results of nitriding of VT1-0 titanium in the plasma of non-self-maintained glow discharge with a hollow cathode are presented. A nitriding process has been implemented in different gas mixtures at low pressure and temperatures less than 650°C. It is shown that two-hour nitriding in a helium-nitrogen mixture leads to formation of a nitrided layer on the specimen's surface. The obtained layer hardness of 14.5 GPa exceeds the hardness corresponding to pure nitrogen and argon-nitrogen nitriding by a factor of 2 and 1.5, respectively.
| Original language | English |
|---|---|
| Pages (from-to) | 166-170 |
| Number of pages | 5 |
| Journal | Journal of Surface Investigation |
| Volume | 2 |
| Issue number | 1 |
| DOIs | |
| Publication status | Published - 1 Feb 2008 |
ASJC Scopus subject areas
- Surfaces, Coatings and Films
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Akhmadeev, Y. K., Ivanov, Y. F., Koval', N. N., Lopatin, I. V., & Shchanin, P. M. (2008). Nitriding of VT1-0 titanium in low-pressure non-self-maintained glow discharge with the use of different gas mixtures. Journal of Surface Investigation, 2(1), 166-170. https://doi.org/10.1007/s11700-008-1026-9