Nitriding of VT1-0 titanium in low-pressure non-self-maintained glow discharge with the use of different gas mixtures

Yu Kh Akhmadeev, Yu F. Ivanov, N. N. Koval', I. V. Lopatin, P. M. Shchanin

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Abstract

The results of nitriding of VT1-0 titanium in the plasma of non-self-maintained glow discharge with a hollow cathode are presented. A nitriding process has been implemented in different gas mixtures at low pressure and temperatures less than 650°C. It is shown that two-hour nitriding in a helium-nitrogen mixture leads to formation of a nitrided layer on the specimen's surface. The obtained layer hardness of 14.5 GPa exceeds the hardness corresponding to pure nitrogen and argon-nitrogen nitriding by a factor of 2 and 1.5, respectively.

Original languageEnglish
Pages (from-to)166-170
Number of pages5
JournalJournal of Surface Investigation
Volume2
Issue number1
DOIs
Publication statusPublished - 1 Feb 2008

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ASJC Scopus subject areas

  • Surfaces, Coatings and Films

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