Nitriding of technical-purity titanium in hollow-cathode glow discharge

Yu Kh Akhmadeev, I. M. Goncharenko, Yu F. Ivanov, N. N. Koval, P. M. Schanin

Research output: Contribution to journalReview articlepeer-review

6 Citations (Scopus)

Abstract

The process of nitriding at low pressures and temperatures (≤550°C) in hollow-cathode glow discharge plasma was studied for technical-purity titanium of the VT1-0 commercial grade. The diffusion saturation of titanium with nitrogen in plasma with a concentration of n = 1010-10 11 cm-3 takes place at an ion current density on the cathode within 1.6-4.0 mA/cm2. It is established that a key role in the process of metal saturation is played by atomic nitrogen. The experiments revealed the formation of a layer of gradient structure with a high microhardness (∼14 GPa) on the surface of nitrided titanium.

Original languageEnglish
Pages (from-to)548-550
Number of pages3
JournalTechnical Physics Letters
Volume31
Issue number7
DOIs
Publication statusPublished - 24 Aug 2005

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)

Fingerprint Dive into the research topics of 'Nitriding of technical-purity titanium in hollow-cathode glow discharge'. Together they form a unique fingerprint.

Cite this