Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment

D. Pavelescu, M. Braic, M. Balaceanu, A. Vladescu, C. N. Zoita, I. Feraru, V. Braic

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The paper examines the effects of ion bombardment flux (ji) on film characteristics, under the conditions when ion energy (Ei) and the ratio of the ion flux to the flux of deposited atoms (ji/j a) were kept constant, considering nickel carbide films deposited on Si(100) and C45 steel substrates by the cathodic arc method in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 5.1 mA/cm2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, chemical bondings, texture, residual stress, hardness and tribological performance. The experimental results showed that film crystallinity, hardness, friction and wear resistance of the NiC coatings improved at increased ion bombardment intensity.

Original languageEnglish
Title of host publicationISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings
Pages483-485
Number of pages3
DOIs
Publication statusPublished - 29 Dec 2010
Externally publishedYes
Event24th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2010 - Braunschweig, Germany
Duration: 30 Aug 20103 Sep 2010

Publication series

NameProceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
ISSN (Print)1093-2941

Conference

Conference24th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2010
CountryGermany
CityBraunschweig
Period30.8.103.9.10

Fingerprint

Plasma deposition
Ion bombardment
Carbides
Nickel
Vacuum
Fluxes
Hardness
Coatings
Ions
Substrates
Phase composition
Wear resistance
Residual stresses
Cathodes
Current density
Textures
Friction
Atoms
Steel

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Software

Cite this

Pavelescu, D., Braic, M., Balaceanu, M., Vladescu, A., Zoita, C. N., Feraru, I., & Braic, V. (2010). Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. In ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings (pp. 483-485). [05625832] (Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV). https://doi.org/10.1109/DEIV.2010.5625832

Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. / Pavelescu, D.; Braic, M.; Balaceanu, M.; Vladescu, A.; Zoita, C. N.; Feraru, I.; Braic, V.

ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings. 2010. p. 483-485 05625832 (Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV).

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Pavelescu, D, Braic, M, Balaceanu, M, Vladescu, A, Zoita, CN, Feraru, I & Braic, V 2010, Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. in ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings., 05625832, Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, pp. 483-485, 24th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2010, Braunschweig, Germany, 30.8.10. https://doi.org/10.1109/DEIV.2010.5625832
Pavelescu D, Braic M, Balaceanu M, Vladescu A, Zoita CN, Feraru I et al. Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. In ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings. 2010. p. 483-485. 05625832. (Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV). https://doi.org/10.1109/DEIV.2010.5625832
Pavelescu, D. ; Braic, M. ; Balaceanu, M. ; Vladescu, A. ; Zoita, C. N. ; Feraru, I. ; Braic, V. / Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings. 2010. pp. 483-485 (Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV).
@inproceedings{9b4bf151bc91439495371c35836e017e,
title = "Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment",
abstract = "The paper examines the effects of ion bombardment flux (ji) on film characteristics, under the conditions when ion energy (Ei) and the ratio of the ion flux to the flux of deposited atoms (ji/j a) were kept constant, considering nickel carbide films deposited on Si(100) and C45 steel substrates by the cathodic arc method in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 5.1 mA/cm2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, chemical bondings, texture, residual stress, hardness and tribological performance. The experimental results showed that film crystallinity, hardness, friction and wear resistance of the NiC coatings improved at increased ion bombardment intensity.",
author = "D. Pavelescu and M. Braic and M. Balaceanu and A. Vladescu and Zoita, {C. N.} and I. Feraru and V. Braic",
year = "2010",
month = "12",
day = "29",
doi = "10.1109/DEIV.2010.5625832",
language = "English",
isbn = "9781424483655",
series = "Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV",
pages = "483--485",
booktitle = "ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings",

}

TY - GEN

T1 - Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment

AU - Pavelescu, D.

AU - Braic, M.

AU - Balaceanu, M.

AU - Vladescu, A.

AU - Zoita, C. N.

AU - Feraru, I.

AU - Braic, V.

PY - 2010/12/29

Y1 - 2010/12/29

N2 - The paper examines the effects of ion bombardment flux (ji) on film characteristics, under the conditions when ion energy (Ei) and the ratio of the ion flux to the flux of deposited atoms (ji/j a) were kept constant, considering nickel carbide films deposited on Si(100) and C45 steel substrates by the cathodic arc method in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 5.1 mA/cm2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, chemical bondings, texture, residual stress, hardness and tribological performance. The experimental results showed that film crystallinity, hardness, friction and wear resistance of the NiC coatings improved at increased ion bombardment intensity.

AB - The paper examines the effects of ion bombardment flux (ji) on film characteristics, under the conditions when ion energy (Ei) and the ratio of the ion flux to the flux of deposited atoms (ji/j a) were kept constant, considering nickel carbide films deposited on Si(100) and C45 steel substrates by the cathodic arc method in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 5.1 mA/cm2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, chemical bondings, texture, residual stress, hardness and tribological performance. The experimental results showed that film crystallinity, hardness, friction and wear resistance of the NiC coatings improved at increased ion bombardment intensity.

UR - http://www.scopus.com/inward/record.url?scp=78650441646&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=78650441646&partnerID=8YFLogxK

U2 - 10.1109/DEIV.2010.5625832

DO - 10.1109/DEIV.2010.5625832

M3 - Conference contribution

SN - 9781424483655

T3 - Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV

SP - 483

EP - 485

BT - ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings

ER -