Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment

Abstract

The paper examines the effects of ion bombardment flux (j_i) on film characteristics, under the conditions when ion energy (E_i) and the ratio of the ion flux to the flux of deposited atoms (j_i/j _a) were kept constant, considering nickel carbide films deposited on Si(100) and C45 steel substrates by the cathodic arc method in a CH ₄+Ar mixture. The substrate current density was varied from 2.7 to 5.1 mA/cm² by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, chemical bondings, texture, residual stress, hardness and tribological performance. The experimental results showed that film crystallinity, hardness, friction and wear resistance of the NiC coatings improved at increased ion bombardment intensity.

Original language	English
Title of host publication	ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings
Pages	483-485
Number of pages	3
DOIs	https://doi.org/10.1109/DEIV.2010.5625832
Publication status	Published - 29 Dec 2010
Externally published	Yes
Event	24th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2010 - Braunschweig, Germany Duration: 30 Aug 2010 → 3 Sep 2010

Publication series

Name	Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
ISSN (Print)	1093-2941

Conference

Conference	24th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2010
Country	Germany
City	Braunschweig
Period	30.8.10 → 3.9.10

ASJC Scopus subject areas

Computer Networks and Communications
Software

Access to Document

10.1109/DEIV.2010.5625832

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Pavelescu, D., Braic, M., Balaceanu, M., Vladescu, A., Zoita, C. N., Feraru, I., & Braic, V. (2010). Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. In ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings (pp. 483-485). [05625832] (Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV). https://doi.org/10.1109/DEIV.2010.5625832

Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. / Pavelescu, D.; Braic, M.; Balaceanu, M.; Vladescu, A.; Zoita, C. N.; Feraru, I.; Braic, V.

ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings. 2010. p. 483-485 05625832 (Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Pavelescu, D, Braic, M, Balaceanu, M, Vladescu, A, Zoita, CN, Feraru, I & Braic, V 2010, Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. in ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings., 05625832, Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, pp. 483-485, 24th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2010, Braunschweig, Germany, 30.8.10. https://doi.org/10.1109/DEIV.2010.5625832

Pavelescu D, Braic M, Balaceanu M, Vladescu A, Zoita CN, Feraru I et al. Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. In ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings. 2010. p. 483-485. 05625832. (Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV). https://doi.org/10.1109/DEIV.2010.5625832

Pavelescu, D. ; Braic, M. ; Balaceanu, M. ; Vladescu, A. ; Zoita, C. N. ; Feraru, I. ; Braic, V. / Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings. 2010. pp. 483-485 (Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV).

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abstract = "The paper examines the effects of ion bombardment flux (ji) on film characteristics, under the conditions when ion energy (Ei) and the ratio of the ion flux to the flux of deposited atoms (ji/j a) were kept constant, considering nickel carbide films deposited on Si(100) and C45 steel substrates by the cathodic arc method in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 5.1 mA/cm2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, chemical bondings, texture, residual stress, hardness and tribological performance. The experimental results showed that film crystallinity, hardness, friction and wear resistance of the NiC coatings improved at increased ion bombardment intensity.",

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AU - Feraru, I.

AU - Braic, V.

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