Abstract
The paper examines the effects of ion bombardment flux (ji) on film characteristics, under the conditions when ion energy (Ei) and the ratio of the ion flux to the flux of deposited atoms (ji/j a) were kept constant, considering nickel carbide films deposited on Si(100) and C45 steel substrates by the cathodic arc method in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 5.1 mA/cm2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, chemical bondings, texture, residual stress, hardness and tribological performance. The experimental results showed that film crystallinity, hardness, friction and wear resistance of the NiC coatings improved at increased ion bombardment intensity.
| Original language | English |
|---|---|
| Title of host publication | ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings |
| Pages | 483-485 |
| Number of pages | 3 |
| DOIs | |
| Publication status | Published - 29 Dec 2010 |
| Externally published | Yes |
| Event | 24th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2010 - Braunschweig, Germany Duration: 30 Aug 2010 → 3 Sep 2010 |
Publication series
| Name | Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV |
|---|---|
| ISSN (Print) | 1093-2941 |
Conference
| Conference | 24th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2010 |
|---|---|
| Country | Germany |
| City | Braunschweig |
| Period | 30.8.10 → 3.9.10 |
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ASJC Scopus subject areas
- Computer Networks and Communications
- Software
Cite this
Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. / Pavelescu, D.; Braic, M.; Balaceanu, M.; Vladescu, A.; Zoita, C. N.; Feraru, I.; Braic, V.
ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings. 2010. p. 483-485 05625832 (Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment
AU - Pavelescu, D.
AU - Braic, M.
AU - Balaceanu, M.
AU - Vladescu, A.
AU - Zoita, C. N.
AU - Feraru, I.
AU - Braic, V.
PY - 2010/12/29
Y1 - 2010/12/29
N2 - The paper examines the effects of ion bombardment flux (ji) on film characteristics, under the conditions when ion energy (Ei) and the ratio of the ion flux to the flux of deposited atoms (ji/j a) were kept constant, considering nickel carbide films deposited on Si(100) and C45 steel substrates by the cathodic arc method in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 5.1 mA/cm2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, chemical bondings, texture, residual stress, hardness and tribological performance. The experimental results showed that film crystallinity, hardness, friction and wear resistance of the NiC coatings improved at increased ion bombardment intensity.
AB - The paper examines the effects of ion bombardment flux (ji) on film characteristics, under the conditions when ion energy (Ei) and the ratio of the ion flux to the flux of deposited atoms (ji/j a) were kept constant, considering nickel carbide films deposited on Si(100) and C45 steel substrates by the cathodic arc method in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 5.1 mA/cm2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, chemical bondings, texture, residual stress, hardness and tribological performance. The experimental results showed that film crystallinity, hardness, friction and wear resistance of the NiC coatings improved at increased ion bombardment intensity.
UR - http://www.scopus.com/inward/record.url?scp=78650441646&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=78650441646&partnerID=8YFLogxK
U2 - 10.1109/DEIV.2010.5625832
DO - 10.1109/DEIV.2010.5625832
M3 - Conference contribution
AN - SCOPUS:78650441646
SN - 9781424483655
T3 - Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
SP - 483
EP - 485
BT - ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings
ER -