Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment

D. Pavelescu, M. Braic, M. Balaceanu, A. Vladescu, C. N. Zoita, I. Feraru, V. Braic

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The paper examines the effects of ion bombardment flux (ji) on film characteristics, under the conditions when ion energy (Ei) and the ratio of the ion flux to the flux of deposited atoms (ji/j a) were kept constant, considering nickel carbide films deposited on Si(100) and C45 steel substrates by the cathodic arc method in a CH 4+Ar mixture. The substrate current density was varied from 2.7 to 5.1 mA/cm2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, chemical bondings, texture, residual stress, hardness and tribological performance. The experimental results showed that film crystallinity, hardness, friction and wear resistance of the NiC coatings improved at increased ion bombardment intensity.

Original languageEnglish
Title of host publicationISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings
Pages483-485
Number of pages3
DOIs
Publication statusPublished - 29 Dec 2010
Externally publishedYes
Event24th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2010 - Braunschweig, Germany
Duration: 30 Aug 20103 Sep 2010

Publication series

NameProceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV
ISSN (Print)1093-2941

Conference

Conference24th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV 2010
CountryGermany
CityBraunschweig
Period30.8.103.9.10

ASJC Scopus subject areas

  • Computer Networks and Communications
  • Software

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  • Cite this

    Pavelescu, D., Braic, M., Balaceanu, M., Vladescu, A., Zoita, C. N., Feraru, I., & Braic, V. (2010). Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment. In ISDEIV 2010 - 24th International Symposium on Discharges and Electrical Insulation in Vacuum, Proceedings (pp. 483-485). [05625832] (Proceedings - International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV). https://doi.org/10.1109/DEIV.2010.5625832