New phase synthesis in surface layer in the conditions of ion implantation

Asfandyar Khan, Anna G. Knyazeva

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The simple models for the formation of a new phase in a surface layer during ion implantation are discussed. The model of the new phase formation in the same conditions and considering the finiteness of relaxation time is suggested. The model parameters were evaluated using literature data. The stresses and strains in diffusion zone were calculated. The authors demonstrated that the concentration distribution and values of stresses depend on the relation between time scales of various physical processes.

Original languageEnglish
Title of host publicationAIP Conference Proceedings
PublisherAmerican Institute of Physics Inc.
Pages245-249
Number of pages5
Volume1623
ISBN (Print)9780735412606
DOIs
Publication statusPublished - 2014
EventInternational Conference on Physical Mesomechanics of Multilevel Systems 2014 - Tomsk, Russian Federation
Duration: 3 Sep 20145 Sep 2014

Other

OtherInternational Conference on Physical Mesomechanics of Multilevel Systems 2014
CountryRussian Federation
CityTomsk
Period3.9.145.9.14

Keywords

  • Ion implantation
  • Phases formation
  • Relaxation time
  • Surface layer modification

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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  • Cite this

    Khan, A., & Knyazeva, A. G. (2014). New phase synthesis in surface layer in the conditions of ion implantation. In AIP Conference Proceedings (Vol. 1623, pp. 245-249). American Institute of Physics Inc.. https://doi.org/10.1063/1.4898928