Abstract
The review is devoted to the analysis of the present state-of-the-art and development trends of the new methods and equipment being developed in the Nuclear Physics Institute, Tomsk (NPI), for dc vacuum arc-based ion and plasma materials processing. The features and advantages are demonstrated for the method of high-concentration implantation with compensation of surface ion sputtering by metal plasma deposition, the method of metal plasma deposition under repetitively - pulsed ion mixing with ion beams and plasma flow formed in the "Raduga-5" source, and the method of coating deposition and ion implantation, including an application of the filtered dc metal plasma source and high-frequency short-pulsed negative bias voltage with a duty factor in the range 10% - 99%. The features of ion implantation and metal plasma deposition for dielectric, semi-conducting and metal samples are presented.
Original language | English |
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Pages (from-to) | 8637-8640 |
Number of pages | 4 |
Journal | Surface and Coatings Technology |
Volume | 201 |
Issue number | 19-20 SPEC. ISS. |
DOIs | |
Publication status | Published - 5 Aug 2007 |
Keywords
- Coating deposition
- Ion implantation
- Metal plasma
ASJC Scopus subject areas
- Surfaces, Coatings and Films
- Condensed Matter Physics
- Surfaces and Interfaces