Nanosized Mn-Ni oxide thin films via anodic electrodeposition

A study of the correlations between morphology, structure and capacitive behaviour

Mohammad H. Tahmasebi, Antonello Vicenzo, Mazdak Hashempour, Massimiliano Bestetti, Mohammad A. Golozar, Keyvan Raeissi

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The present study addresses the synthesis of manganese-nickel oxide thin films via potentiodynamic anodic electrodeposition as supercapacitor electrodes. We study in particular the effect of the deposition scan rate and of the Ni(II) to Mn(II) molar ratio in the deposition bath on the capacitive behaviour of mixed oxide electrodes. The increase of the nickel content in oxide thin films of composition NixMn1-xOy (with x in the range from 0 to 0.17) results in the increase of specific capacitance up to a maximum for about 10 at% Ni. The deposition scan rate affects the capacitive behaviour of mixed oxide electrodes through its effects on layer morphology and surface structure. In particular, thin film electrodes at about 10 at% Ni show a maximum in the specific capacitance for deposition scan rate of 600 mV s-1, which is shown to be related to the attendant modifications in surface morphology and topography. After annealing at 200 °C, 6 h, partial crystallization of the amorphous structure of the as-grown mixed oxide takes place with formation of dispersed nanocrystalline domains. The annealed electrode at 10 at% Ni, with mass loading of 0.30 mg cm-2, show the highest specific capacitance (250 F g-1, at 0.1 A g-1), and specific energy and power as high as 34.5 Wh kg-1 (at 50 W kg-1), and 4.3 kW kg-1 (at 15.7 Wh kg-1). Mixed oxide of the same composition and mass loading reveal a 122% capacitance retention after 10,000 cycles in 1 M Na2SO4 at 20 A g-1.

Original languageEnglish
Pages (from-to)143-154
Number of pages12
JournalElectrochimica Acta
Volume206
DOIs
Publication statusPublished - 10 Jul 2016
Externally publishedYes

Fingerprint

Electrodeposition
Oxide films
Oxides
Capacitance
Thin films
Electrodes
Nickel oxide
Surface topography
Manganese
Crystallization
Nickel
Chemical analysis
Surface structure
Surface morphology
Annealing

Keywords

  • electrodeposition
  • manganese-nickel oxide
  • potentiodynamic method
  • supercapacitors

ASJC Scopus subject areas

  • Chemical Engineering(all)
  • Electrochemistry

Cite this

Nanosized Mn-Ni oxide thin films via anodic electrodeposition : A study of the correlations between morphology, structure and capacitive behaviour. / Tahmasebi, Mohammad H.; Vicenzo, Antonello; Hashempour, Mazdak; Bestetti, Massimiliano; Golozar, Mohammad A.; Raeissi, Keyvan.

In: Electrochimica Acta, Vol. 206, 10.07.2016, p. 143-154.

Research output: Contribution to journalArticle

Tahmasebi, Mohammad H. ; Vicenzo, Antonello ; Hashempour, Mazdak ; Bestetti, Massimiliano ; Golozar, Mohammad A. ; Raeissi, Keyvan. / Nanosized Mn-Ni oxide thin films via anodic electrodeposition : A study of the correlations between morphology, structure and capacitive behaviour. In: Electrochimica Acta. 2016 ; Vol. 206. pp. 143-154.
@article{c34ba3d3897c40d7b7561ba0f7848697,
title = "Nanosized Mn-Ni oxide thin films via anodic electrodeposition: A study of the correlations between morphology, structure and capacitive behaviour",
abstract = "The present study addresses the synthesis of manganese-nickel oxide thin films via potentiodynamic anodic electrodeposition as supercapacitor electrodes. We study in particular the effect of the deposition scan rate and of the Ni(II) to Mn(II) molar ratio in the deposition bath on the capacitive behaviour of mixed oxide electrodes. The increase of the nickel content in oxide thin films of composition NixMn1-xOy (with x in the range from 0 to 0.17) results in the increase of specific capacitance up to a maximum for about 10 at{\%} Ni. The deposition scan rate affects the capacitive behaviour of mixed oxide electrodes through its effects on layer morphology and surface structure. In particular, thin film electrodes at about 10 at{\%} Ni show a maximum in the specific capacitance for deposition scan rate of 600 mV s-1, which is shown to be related to the attendant modifications in surface morphology and topography. After annealing at 200 °C, 6 h, partial crystallization of the amorphous structure of the as-grown mixed oxide takes place with formation of dispersed nanocrystalline domains. The annealed electrode at 10 at{\%} Ni, with mass loading of 0.30 mg cm-2, show the highest specific capacitance (250 F g-1, at 0.1 A g-1), and specific energy and power as high as 34.5 Wh kg-1 (at 50 W kg-1), and 4.3 kW kg-1 (at 15.7 Wh kg-1). Mixed oxide of the same composition and mass loading reveal a 122{\%} capacitance retention after 10,000 cycles in 1 M Na2SO4 at 20 A g-1.",
keywords = "electrodeposition, manganese-nickel oxide, potentiodynamic method, supercapacitors",
author = "Tahmasebi, {Mohammad H.} and Antonello Vicenzo and Mazdak Hashempour and Massimiliano Bestetti and Golozar, {Mohammad A.} and Keyvan Raeissi",
year = "2016",
month = "7",
day = "10",
doi = "10.1016/j.electacta.2016.04.087",
language = "English",
volume = "206",
pages = "143--154",
journal = "Electrochimica Acta",
issn = "0013-4686",
publisher = "Elsevier Limited",

}

TY - JOUR

T1 - Nanosized Mn-Ni oxide thin films via anodic electrodeposition

T2 - A study of the correlations between morphology, structure and capacitive behaviour

AU - Tahmasebi, Mohammad H.

AU - Vicenzo, Antonello

AU - Hashempour, Mazdak

AU - Bestetti, Massimiliano

AU - Golozar, Mohammad A.

AU - Raeissi, Keyvan

PY - 2016/7/10

Y1 - 2016/7/10

N2 - The present study addresses the synthesis of manganese-nickel oxide thin films via potentiodynamic anodic electrodeposition as supercapacitor electrodes. We study in particular the effect of the deposition scan rate and of the Ni(II) to Mn(II) molar ratio in the deposition bath on the capacitive behaviour of mixed oxide electrodes. The increase of the nickel content in oxide thin films of composition NixMn1-xOy (with x in the range from 0 to 0.17) results in the increase of specific capacitance up to a maximum for about 10 at% Ni. The deposition scan rate affects the capacitive behaviour of mixed oxide electrodes through its effects on layer morphology and surface structure. In particular, thin film electrodes at about 10 at% Ni show a maximum in the specific capacitance for deposition scan rate of 600 mV s-1, which is shown to be related to the attendant modifications in surface morphology and topography. After annealing at 200 °C, 6 h, partial crystallization of the amorphous structure of the as-grown mixed oxide takes place with formation of dispersed nanocrystalline domains. The annealed electrode at 10 at% Ni, with mass loading of 0.30 mg cm-2, show the highest specific capacitance (250 F g-1, at 0.1 A g-1), and specific energy and power as high as 34.5 Wh kg-1 (at 50 W kg-1), and 4.3 kW kg-1 (at 15.7 Wh kg-1). Mixed oxide of the same composition and mass loading reveal a 122% capacitance retention after 10,000 cycles in 1 M Na2SO4 at 20 A g-1.

AB - The present study addresses the synthesis of manganese-nickel oxide thin films via potentiodynamic anodic electrodeposition as supercapacitor electrodes. We study in particular the effect of the deposition scan rate and of the Ni(II) to Mn(II) molar ratio in the deposition bath on the capacitive behaviour of mixed oxide electrodes. The increase of the nickel content in oxide thin films of composition NixMn1-xOy (with x in the range from 0 to 0.17) results in the increase of specific capacitance up to a maximum for about 10 at% Ni. The deposition scan rate affects the capacitive behaviour of mixed oxide electrodes through its effects on layer morphology and surface structure. In particular, thin film electrodes at about 10 at% Ni show a maximum in the specific capacitance for deposition scan rate of 600 mV s-1, which is shown to be related to the attendant modifications in surface morphology and topography. After annealing at 200 °C, 6 h, partial crystallization of the amorphous structure of the as-grown mixed oxide takes place with formation of dispersed nanocrystalline domains. The annealed electrode at 10 at% Ni, with mass loading of 0.30 mg cm-2, show the highest specific capacitance (250 F g-1, at 0.1 A g-1), and specific energy and power as high as 34.5 Wh kg-1 (at 50 W kg-1), and 4.3 kW kg-1 (at 15.7 Wh kg-1). Mixed oxide of the same composition and mass loading reveal a 122% capacitance retention after 10,000 cycles in 1 M Na2SO4 at 20 A g-1.

KW - electrodeposition

KW - manganese-nickel oxide

KW - potentiodynamic method

KW - supercapacitors

UR - http://www.scopus.com/inward/record.url?scp=84964669280&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84964669280&partnerID=8YFLogxK

U2 - 10.1016/j.electacta.2016.04.087

DO - 10.1016/j.electacta.2016.04.087

M3 - Article

VL - 206

SP - 143

EP - 154

JO - Electrochimica Acta

JF - Electrochimica Acta

SN - 0013-4686

ER -