Nanocrystalline nitride coatings deposited by vacuum arc plasma-assisted method

O. V. Krysina, N. N. Koval, Yu F. Ivanov, N. A. Timchenko, T. Baumbach, S. Doyle, T. Slobodskyy

Research output: Contribution to journalArticle

Abstract

In the given work, experiments on research of formation of titanium nitride doped with copper (≤12 at %) produced by plasma-assisted vacuum arc deposition by evaporation of sintered Ti-Cu cathodes were carried out. It was revealed that Ti-Cu-N coatings have high hardness (≈40 GPa), high elastic recovery (≥50%), low friction coefficient (≈0.2) and high adhesion to a substrate compared with typical TiN coatings. By methods of transmission electron microscopy of thin foils and x-ray diffraction, it was showed that the coating crystallites consist of δ-TiN with the average crystallite size of 10-30 nm and the sheath of doping elements (copper) with thickness of 2-3 monolayers is formed around of TiN crystallites.

Original languageEnglish
Article number012021
JournalJournal of Physics: Conference Series
Volume370
Issue number1
DOIs
Publication statusPublished - 2012

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Fingerprint Dive into the research topics of 'Nanocrystalline nitride coatings deposited by vacuum arc plasma-assisted method'. Together they form a unique fingerprint.

  • Cite this