Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam

Yurii Ivanov, Vladimir Shugurov, Mark Kalashnikov, Andrey Leonov, Anton Teresov, Maria Petukevich, Valentina Polisadova

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 μm was formed by vacuum electric-arc plasma-assisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm2, pulse duration 200 μs, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly exceeding the microhardness of the initial SiC ceramics.

Original languageEnglish
Title of host publicationProceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures
EditorsVasily M. Fomin, Victor E. Panin, Sergey G. Psakhie
PublisherAmerican Institute of Physics Inc.
Volume2051
ISBN (Electronic)9780735417779
DOIs
Publication statusPublished - 12 Dec 2018
EventInternational Symposium on Hierarchical Materials: Development and Applications for New Technologies and Reliable Structures 2018 - Tomsk, Russian Federation
Duration: 1 Oct 20185 Oct 2018

Conference

ConferenceInternational Symposium on Hierarchical Materials: Development and Applications for New Technologies and Reliable Structures 2018
CountryRussian Federation
CityTomsk
Period1.10.185.10.18

Fingerprint

electron beams
ceramics
irradiation
microhardness
titanium
nanostructure (characteristics)
electric arcs
residual gas
spraying
grade
surface layers
sintering
pulse duration
flux density
chambers
cathodes
argon
melting
electron energy
vacuum

ASJC Scopus subject areas

  • Physics and Astronomy(all)

Cite this

Ivanov, Y., Shugurov, V., Kalashnikov, M., Leonov, A., Teresov, A., Petukevich, M., & Polisadova, V. (2018). Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam. In V. M. Fomin, V. E. Panin, & S. G. Psakhie (Eds.), Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures (Vol. 2051). [020110] American Institute of Physics Inc.. https://doi.org/10.1063/1.5083353

Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam. / Ivanov, Yurii; Shugurov, Vladimir; Kalashnikov, Mark; Leonov, Andrey; Teresov, Anton; Petukevich, Maria; Polisadova, Valentina.

Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures. ed. / Vasily M. Fomin; Victor E. Panin; Sergey G. Psakhie. Vol. 2051 American Institute of Physics Inc., 2018. 020110.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Ivanov, Y, Shugurov, V, Kalashnikov, M, Leonov, A, Teresov, A, Petukevich, M & Polisadova, V 2018, Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam. in VM Fomin, VE Panin & SG Psakhie (eds), Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures. vol. 2051, 020110, American Institute of Physics Inc., International Symposium on Hierarchical Materials: Development and Applications for New Technologies and Reliable Structures 2018, Tomsk, Russian Federation, 1.10.18. https://doi.org/10.1063/1.5083353
Ivanov Y, Shugurov V, Kalashnikov M, Leonov A, Teresov A, Petukevich M et al. Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam. In Fomin VM, Panin VE, Psakhie SG, editors, Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures. Vol. 2051. American Institute of Physics Inc. 2018. 020110 https://doi.org/10.1063/1.5083353
Ivanov, Yurii ; Shugurov, Vladimir ; Kalashnikov, Mark ; Leonov, Andrey ; Teresov, Anton ; Petukevich, Maria ; Polisadova, Valentina. / Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam. Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures. editor / Vasily M. Fomin ; Victor E. Panin ; Sergey G. Psakhie. Vol. 2051 American Institute of Physics Inc., 2018.
@inproceedings{af6ddcf10d17440e8693ac6c512d62ea,
title = "Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam",
abstract = "The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 μm was formed by vacuum electric-arc plasma-assisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm2, pulse duration 200 μs, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly exceeding the microhardness of the initial SiC ceramics.",
author = "Yurii Ivanov and Vladimir Shugurov and Mark Kalashnikov and Andrey Leonov and Anton Teresov and Maria Petukevich and Valentina Polisadova",
year = "2018",
month = "12",
day = "12",
doi = "10.1063/1.5083353",
language = "English",
volume = "2051",
editor = "Fomin, {Vasily M.} and Panin, {Victor E.} and Psakhie, {Sergey G.}",
booktitle = "Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures",
publisher = "American Institute of Physics Inc.",

}

TY - GEN

T1 - Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam

AU - Ivanov, Yurii

AU - Shugurov, Vladimir

AU - Kalashnikov, Mark

AU - Leonov, Andrey

AU - Teresov, Anton

AU - Petukevich, Maria

AU - Polisadova, Valentina

PY - 2018/12/12

Y1 - 2018/12/12

N2 - The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 μm was formed by vacuum electric-arc plasma-assisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm2, pulse duration 200 μs, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly exceeding the microhardness of the initial SiC ceramics.

AB - The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 μm was formed by vacuum electric-arc plasma-assisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm2, pulse duration 200 μs, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly exceeding the microhardness of the initial SiC ceramics.

UR - http://www.scopus.com/inward/record.url?scp=85059014214&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=85059014214&partnerID=8YFLogxK

U2 - 10.1063/1.5083353

DO - 10.1063/1.5083353

M3 - Conference contribution

VL - 2051

BT - Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures

A2 - Fomin, Vasily M.

A2 - Panin, Victor E.

A2 - Psakhie, Sergey G.

PB - American Institute of Physics Inc.

ER -