Abstract
The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 μm was formed by vacuum electric-arc plasma-assisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm2, pulse duration 200 μs, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly exceeding the microhardness of the initial SiC ceramics.
| Original language | English |
|---|---|
| Title of host publication | Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures |
| Editors | Vasily M. Fomin, Victor E. Panin, Sergey G. Psakhie |
| Publisher | American Institute of Physics Inc. |
| Volume | 2051 |
| ISBN (Electronic) | 9780735417779 |
| DOIs | |
| Publication status | Published - 12 Dec 2018 |
| Event | International Symposium on Hierarchical Materials: Development and Applications for New Technologies and Reliable Structures 2018 - Tomsk, Russian Federation Duration: 1 Oct 2018 → 5 Oct 2018 |
Conference
| Conference | International Symposium on Hierarchical Materials: Development and Applications for New Technologies and Reliable Structures 2018 |
|---|---|
| Country | Russian Federation |
| City | Tomsk |
| Period | 1.10.18 → 5.10.18 |
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ASJC Scopus subject areas
- Physics and Astronomy(all)
Cite this
Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam. / Ivanov, Yurii; Shugurov, Vladimir; Kalashnikov, Mark; Leonov, Andrey; Teresov, Anton; Petukevich, Maria; Polisadova, Valentina.
Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures. ed. / Vasily M. Fomin; Victor E. Panin; Sergey G. Psakhie. Vol. 2051 American Institute of Physics Inc., 2018. 020110.Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
}
TY - GEN
T1 - Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam
AU - Ivanov, Yurii
AU - Shugurov, Vladimir
AU - Kalashnikov, Mark
AU - Leonov, Andrey
AU - Teresov, Anton
AU - Petukevich, Maria
AU - Polisadova, Valentina
PY - 2018/12/12
Y1 - 2018/12/12
N2 - The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 μm was formed by vacuum electric-arc plasma-assisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm2, pulse duration 200 μs, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly exceeding the microhardness of the initial SiC ceramics.
AB - The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 μm was formed by vacuum electric-arc plasma-assisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm2, pulse duration 200 μs, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly exceeding the microhardness of the initial SiC ceramics.
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U2 - 10.1063/1.5083353
DO - 10.1063/1.5083353
M3 - Conference contribution
VL - 2051
BT - Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures
A2 - Fomin, Vasily M.
A2 - Panin, Victor E.
A2 - Psakhie, Sergey G.
PB - American Institute of Physics Inc.
ER -