Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam

Abstract

The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 μm was formed by vacuum electric-arc plasma-assisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm², pulse duration 200 μs, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly exceeding the microhardness of the initial SiC ceramics.

Original language	English
Title of host publication	Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures
Editors	Vasily M. Fomin, Victor E. Panin, Sergey G. Psakhie
Publisher	American Institute of Physics Inc.
Volume	2051
ISBN (Electronic)	9780735417779
DOIs	https://doi.org/10.1063/1.5083353
Publication status	Published - 12 Dec 2018
Event	International Symposium on Hierarchical Materials: Development and Applications for New Technologies and Reliable Structures 2018 - Tomsk, Russian Federation Duration: 1 Oct 2018 → 5 Oct 2018

Conference

Conference	International Symposium on Hierarchical Materials: Development and Applications for New Technologies and Reliable Structures 2018
Country	Russian Federation
City	Tomsk
Period	1.10.18 → 5.10.18

ASJC Scopus subject areas

Physics and Astronomy(all)

Access to Document

10.1063/1.5083353

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Ivanov, Y., Shugurov, V., Kalashnikov, M., Leonov, A., Teresov, A., Petukevich, M., & Polisadova, V. (2018). Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam. In V. M. Fomin, V. E. Panin, & S. G. Psakhie (Eds.), Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures (Vol. 2051). [020110] American Institute of Physics Inc.. https://doi.org/10.1063/1.5083353

Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam. / Ivanov, Yurii; Shugurov, Vladimir; Kalashnikov, Mark ; Leonov, Andrey; Teresov, Anton; Petukevich, Maria; Polisadova, Valentina.

Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures. ed. / Vasily M. Fomin; Victor E. Panin; Sergey G. Psakhie. Vol. 2051 American Institute of Physics Inc., 2018. 020110.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Ivanov, Y, Shugurov, V, Kalashnikov, M , Leonov, A, Teresov, A, Petukevich, M & Polisadova, V 2018, Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam. in VM Fomin, VE Panin & SG Psakhie (eds), Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures. vol. 2051, 020110, American Institute of Physics Inc., International Symposium on Hierarchical Materials: Development and Applications for New Technologies and Reliable Structures 2018, Tomsk, Russian Federation, 1.10.18. https://doi.org/10.1063/1.5083353

Ivanov Y, Shugurov V, Kalashnikov M , Leonov A, Teresov A, Petukevich M et al. Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam. In Fomin VM, Panin VE, Psakhie SG, editors, Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures. Vol. 2051. American Institute of Physics Inc. 2018. 020110 https://doi.org/10.1063/1.5083353

Ivanov, Yurii ; Shugurov, Vladimir ; Kalashnikov, Mark ; Leonov, Andrey ; Teresov, Anton ; Petukevich, Maria ; Polisadova, Valentina. / Multilevel hierarchical structure formed in the film (Ti)/substrate (SiC-ceramics) system under irradiation by an intense pulsed electron beam. Proceedings of the Advanced Materials with Hierarchical Structure for New Technologies and Reliable Structures. editor / Vasily M. Fomin ; Victor E. Panin ; Sergey G. Psakhie. Vol. 2051 American Institute of Physics Inc., 2018.

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abstract = "The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 μm was formed by vacuum electric-arc plasma-assisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm2, pulse duration 200 μs, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly exceeding the microhardness of the initial SiC ceramics.",

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AU - Leonov, Andrey

AU - Teresov, Anton

AU - Petukevich, Maria

AU - Polisadova, Valentina

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N2 - The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 μm was formed by vacuum electric-arc plasma-assisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm2, pulse duration 200 μs, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly exceeding the microhardness of the initial SiC ceramics.

AB - The aim of this study was the formation of multilevel hierarchical structure in the SiC ceramics surface layer as a result melting of the film (Ti)/substrate (SiC-ceramics) system by an intense pulsed electron beam. SiC ceramics samples obtained by SPS-sintering were used. Titanium film of 0.5 μm was formed by vacuum electric-arc plasma-assisted spraying of cathode from VT1-0 technical-grade titanium. Irradiation of the film/substrate system was carried out with an intense pulsed electron beam of submillisecond duration with the following parameters: accelerated electron energy 17 keV, electron beam energy density 15 J/cm2, pulse duration 200 μs, quantity of pulses 30, and residual gas (argon) pressure in the working chamber 0.03 Pa. As a result of completed studies formation of multilevel multiphase submicro-nanocrystalline hierarchical structure with microhardness in the range from 35 to 96 GPa was found, repeatedly exceeding the microhardness of the initial SiC ceramics.

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