Modeling of the impurity distribution obtained by ion implantation

V. G. Abdrashitov, V. V. Ryzhov

Research output: Contribution to journalArticle

Abstract

Models and a suite of programs (TRION, PIRSON, CHAPS, and DYCOD) that make it possible to calculate the impurity distribution for any implantation dose in a target with arbitrary composition are described. Test calculations for each program showed that the results are in good agreement with experimental data and with theoretical calculations performed by other authors. The suite of programs is intended for the development of the physical principals of ion-beam technologies.

Original languageEnglish
Pages (from-to)410-422
Number of pages13
JournalRussian Physics Journal
Volume37
Issue number5
DOIs
Publication statusPublished - May 1994

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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