MOCVD growth and study of magnetic Co films

S. I. Dorovskikh, R. R. Hairullin, S. V. Sysoev, V. V. Kriventsov, A. V. Panin, Y. V. Shubin, N. B. Morozova, N. V. Gelfond, S. V. Korenev

Research output: Contribution to journalArticle

Abstract

The Co(N'acN'ac)2 complex, namely bis(2-methylamino-4-methyliminato-penten) cobalt(II), was for the first time used as a precursor for producing Co films via metal-organic chemical vapour deposition. This chelate exhibits good volatility ln (P/P°)=26·45-14006·7/T(K) at moderate temperature values (382-427 K). Co films were grown on Si (100) substrates and studied by Xray diffraction, extended X-ray absorption fine structure, atomic force and scanning electron ; microscopy, energy dispersive X-ray analysis and optical profilometry. Deposition conditions corresponding to the optimal electrical and magnetic characteristics of Co thin films are found.

Original languageEnglish
Pages (from-to)8-14
Number of pages7
JournalSurface Engineering
Volume32
Issue number1
DOIs
Publication statusPublished - 1 Jan 2016

Fingerprint

Metallorganic chemical vapor deposition
metalorganic chemical vapor deposition
Organic Chemicals
Profilometry
Energy dispersive X ray analysis
volatility
Organic chemicals
X ray absorption
Cobalt
chelates
Chemical vapor deposition
Microscopic examination
x rays
cobalt
Diffraction
Metals
fine structure
microscopy
Scanning
Thin films

Keywords

  • Co films
  • Co precursor
  • Magnetic characteristics
  • MOCVD
  • Vapour pressure

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry

Cite this

Dorovskikh, S. I., Hairullin, R. R., Sysoev, S. V., Kriventsov, V. V., Panin, A. V., Shubin, Y. V., ... Korenev, S. V. (2016). MOCVD growth and study of magnetic Co films. Surface Engineering, 32(1), 8-14. https://doi.org/10.1179/1743294414Y.0000000424

MOCVD growth and study of magnetic Co films. / Dorovskikh, S. I.; Hairullin, R. R.; Sysoev, S. V.; Kriventsov, V. V.; Panin, A. V.; Shubin, Y. V.; Morozova, N. B.; Gelfond, N. V.; Korenev, S. V.

In: Surface Engineering, Vol. 32, No. 1, 01.01.2016, p. 8-14.

Research output: Contribution to journalArticle

Dorovskikh, SI, Hairullin, RR, Sysoev, SV, Kriventsov, VV, Panin, AV, Shubin, YV, Morozova, NB, Gelfond, NV & Korenev, SV 2016, 'MOCVD growth and study of magnetic Co films', Surface Engineering, vol. 32, no. 1, pp. 8-14. https://doi.org/10.1179/1743294414Y.0000000424
Dorovskikh SI, Hairullin RR, Sysoev SV, Kriventsov VV, Panin AV, Shubin YV et al. MOCVD growth and study of magnetic Co films. Surface Engineering. 2016 Jan 1;32(1):8-14. https://doi.org/10.1179/1743294414Y.0000000424
Dorovskikh, S. I. ; Hairullin, R. R. ; Sysoev, S. V. ; Kriventsov, V. V. ; Panin, A. V. ; Shubin, Y. V. ; Morozova, N. B. ; Gelfond, N. V. ; Korenev, S. V. / MOCVD growth and study of magnetic Co films. In: Surface Engineering. 2016 ; Vol. 32, No. 1. pp. 8-14.
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