Microstructure of amorphous copper-carbon thin films formed by plasma-enhanced chemical vapor deposition

M. V. Astashynskaya, V. V. Astashynski, N. T. Kvasov, V. V. Uglov

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

The microstructure of copper-carbon Cu/a–C:H nanocomposites formed by plasma-enhanced chemical vapor deposition has been determined by transmission electron microscopy. The formation of spherical copper inclusions embedded in the matrix of amorphous carbon was observed. The average size of the copper inclusions decreases from 16 to 5 nm on increasing the carbon concentration from 8 to 75 at.%. A description of the copper clusters formation processes in the reactor chamber was proposed. The results of calculation of the average size of copper clusters are in good agreement with the observed size of the copper inclusions formed in nanocomposite thin films.

Original languageEnglish
Pages (from-to)115-126
Number of pages12
JournalHigh Temperature Material Processes
Volume20
Issue number2
DOIs
Publication statusPublished - 1 Jan 2016

Fingerprint

Carbon films
Plasma enhanced chemical vapor deposition
Copper
vapor deposition
Thin films
copper
microstructure
Microstructure
carbon
thin films
inclusions
nanocomposites
Carbon
Nanocomposite films
Amorphous carbon
Nanocomposites
chambers
reactors
Transmission electron microscopy
transmission electron microscopy

Keywords

  • Cu/a–C:H composite thin films
  • Microstructure
  • Nanoclusters
  • Plasmaenhanced chemical vapor deposition

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Engineering(all)
  • Materials Science(all)
  • Energy Engineering and Power Technology
  • Spectroscopy
  • Physical and Theoretical Chemistry

Cite this

Microstructure of amorphous copper-carbon thin films formed by plasma-enhanced chemical vapor deposition. / Astashynskaya, M. V.; Astashynski, V. V.; Kvasov, N. T.; Uglov, V. V.

In: High Temperature Material Processes, Vol. 20, No. 2, 01.01.2016, p. 115-126.

Research output: Contribution to journalArticle

Astashynskaya, M. V. ; Astashynski, V. V. ; Kvasov, N. T. ; Uglov, V. V. / Microstructure of amorphous copper-carbon thin films formed by plasma-enhanced chemical vapor deposition. In: High Temperature Material Processes. 2016 ; Vol. 20, No. 2. pp. 115-126.
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