Abstract
A brief review is presented of the "Raduga" 1-4 repetitively pulsed metal vapor vacuum arc ion sources. Their operation principles and functional ranges are described. The Raduga ion sources provide single- and multi-element implantation. These advantages are achieved by using not only pure single-element or mixed ion fluxes, but also pulsed beam sequences with controllable composition and energy of each ion species. Another feature of the ion sources is their ability to generate a sequence of ion beam and plasma stream pulses. Switching between ion irradiation and plasma deposition can be done from pulse to pulse, within each pulse, or after accumulation of a required dose. Some specific features of the emission properties of broad beam metal vapor vacuum arc ion sources are described.
Original language | English |
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Pages (from-to) | 3126-3133 |
Number of pages | 8 |
Journal | Review of Scientific Instruments |
Volume | 65 |
Issue number | 10 |
DOIs | |
Publication status | Published - 1994 |
ASJC Scopus subject areas
- Instrumentation
- Physics and Astronomy (miscellaneous)