Method of voltage measurement at a vacuum load by means of homogeneous short-circuited vacuum-isolated line was considered. Prior to appearance of a measured high-voltage pulse, a magnetic field is formed in the line due to the bias current. Biasing provides fulfillment of magnetic electron isolation conditions and strong pressing of an electron layer down to the cathode already at the voltage wave front. As a result, a weak change of the hot line wave impedance is achieved during a pulse. Theoretical consideration and numerical simulation of the measuring line operation in the presence of bias current basing the applicability of the method was carried out. The method was used to determine the plasma-filled diode voltage at a megavolt voltage level. The absence of electron leakages at the voltage wave propagation of the amplitude ≈1 MV along the measuring line of the length 2.3 m with the wave impedance of 136 Ω and initial bias current of ≈6 kA was realized.
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