Abstract
It is experimentally revealed that the pulse-periodic bias potential provides a multifold decrease in the surface content of microparticles (MPs). It is ascertained that a decrease in the MP concentration at the target can be explained by several physical mechanisms. From experiments with a fine-structure grid, it is found that less than 10% of MPs negatively charged in the plasma can be reflected in the electric field of the charge-separation layer near the sample. A substantial decrease in the MP density occurs after direct interaction between a MP and the sample under the action of a negative HF short-pulse bias potential. Almost half the MP surface density is caused by ion sputtering. A twelvefold reduction in the MP surface density is attained when the target is irradiated for 2 min.
| Original language | English |
|---|---|
| Pages (from-to) | 1148-1155 |
| Number of pages | 8 |
| Journal | Journal of Surface Investigation |
| Volume | 7 |
| Issue number | 6 |
| DOIs | |
| Publication status | Published - 1 Nov 2013 |
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ASJC Scopus subject areas
- Surfaces, Coatings and Films
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Mechanisms and behavioral regularities of the vacuum-arc microparticles near and on a potential electrode immersed in plasma. / Ryabchikov, A. I.; Sivin, Denis Olegovich; Bumagina, A. I.; Struts, V. K.
In: Journal of Surface Investigation, Vol. 7, No. 6, 01.11.2013, p. 1148-1155.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Mechanisms and behavioral regularities of the vacuum-arc microparticles near and on a potential electrode immersed in plasma
AU - Ryabchikov, A. I.
AU - Sivin, Denis Olegovich
AU - Bumagina, A. I.
AU - Struts, V. K.
PY - 2013/11/1
Y1 - 2013/11/1
N2 - It is experimentally revealed that the pulse-periodic bias potential provides a multifold decrease in the surface content of microparticles (MPs). It is ascertained that a decrease in the MP concentration at the target can be explained by several physical mechanisms. From experiments with a fine-structure grid, it is found that less than 10% of MPs negatively charged in the plasma can be reflected in the electric field of the charge-separation layer near the sample. A substantial decrease in the MP density occurs after direct interaction between a MP and the sample under the action of a negative HF short-pulse bias potential. Almost half the MP surface density is caused by ion sputtering. A twelvefold reduction in the MP surface density is attained when the target is irradiated for 2 min.
AB - It is experimentally revealed that the pulse-periodic bias potential provides a multifold decrease in the surface content of microparticles (MPs). It is ascertained that a decrease in the MP concentration at the target can be explained by several physical mechanisms. From experiments with a fine-structure grid, it is found that less than 10% of MPs negatively charged in the plasma can be reflected in the electric field of the charge-separation layer near the sample. A substantial decrease in the MP density occurs after direct interaction between a MP and the sample under the action of a negative HF short-pulse bias potential. Almost half the MP surface density is caused by ion sputtering. A twelvefold reduction in the MP surface density is attained when the target is irradiated for 2 min.
UR - http://www.scopus.com/inward/record.url?scp=84894624443&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84894624443&partnerID=8YFLogxK
U2 - 10.1134/S1027451013060360
DO - 10.1134/S1027451013060360
M3 - Article
AN - SCOPUS:84894624443
VL - 7
SP - 1148
EP - 1155
JO - Journal of Surface Investigation
JF - Journal of Surface Investigation
SN - 1027-4510
IS - 6
ER -