This paper is devoted to the study of the mechanical and tribological properties of a-C:H:SiO x films deposited on a titanium alloy VT1-0 by a plasma chemical deposition method using pulsed bipolar bias voltage. It was shown that after deposition of 2 μm-thick a-C:H:SiO x film on a titanium alloy VT1-0 sample, the root-mean-square surface roughness R q measured using atomic force microscopy decreased from 74 to 50 nm compared to the original substrate. The surface hardness H measured using nanoindentation increased from 3.3 to 12.4 GPa with an almost unchanged elasticity modulus E. As a result, the plasticity index (H/E) of titanium samples increased from 0.03 to 0.11, and the plastic deformation resistance (H 3 /E 2 ) increased from 3 to 156 MPa. Deposition of a-C:H:SiO x film on the titanium alloy VT1-0 surface makes possible to reduce the friction coefficient from 0.3-0.6 to 0.1 and the wear rate from 6 • 10 -4 to 7•10 -6 mm 3 /Nm.
|Journal||IOP Conference Series: Materials Science and Engineering|
|Publication status||Published - 24 Apr 2019|
|Event||International Scientific and Technical Youth Conference on Perspective Materials of Constructional and Medical Purpose 2018, PMCP 2018 - Tomsk, Russian Federation|
Duration: 26 Nov 2018 → 30 Nov 2018
ASJC Scopus subject areas
- Materials Science(all)